公开(公告)号：NL2005821A

公开(公告)日：2011-06-27

申请号：NL2005821

申请日：2010-12-06

Applicant: ASML NETHERLANDS BV

Inventor： STAALS FRANK ,  KERKHOF MARCUS

IPC: G03F7/20

公开(公告)号：NL2005478A

公开(公告)日：2011-05-18

申请号：NL2005478

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KRUIJF NIEK ,  GRAAF ROELOF ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

公开(公告)号：NL2003693A

公开(公告)日：2010-05-20

申请号：NL2003693

申请日：2009-10-22

Applicant: ASML NETHERLANDS BV

Inventor： LEEWIS CHRISTIAN ,  KERKHOF MARCUS ,  MAST KAREL ,  VANOPPEN PETER ,  SANCHEZ RUBEN ALVAREZ

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2003292A

公开(公告)日：2010-03-15

申请号：NL2003292

申请日：2009-07-27

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  SCHAAR MAURITS ,  SMILDE HENDRIK

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2009719A

公开(公告)日：2013-06-05

申请号：NL2009719

申请日：2012-10-29

Applicant: ASML NETHERLANDS BV

Inventor： WEI XIUHONG ,  BIJNEN FRANCISCUS ,  HAREN RICHARD ,  KERKHOF MARCUS ,  MOS EVERHARDUS ,  SIMONS HUBERTUS ,  EDART REMI ,  DECKERS DAVID ,  SCHOUMANS NICOLE ,  LYULINA IRINA

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2005224A

公开(公告)日：2011-02-22

申请号：NL2005224

申请日：2010-08-12

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  KRUIF ROBERTUS

IPC: G03F7/20

公开(公告)号：NL2003589A

公开(公告)日：2010-04-07

申请号：NL2003589

申请日：2009-10-05

Applicant: ASML NETHERLANDS BV

Inventor： LEEWIS CHRISTIAN ,  CRAMER HUGO ,  KERKHOF MARCUS ,  QUAEDACKERS JOHANNES ,  MATTHEUS CHRISTINE

IPC: G03F7/20 ,  H01L23/544

公开(公告)号：NL2003404A

公开(公告)日：2010-03-17

申请号：NL2003404

申请日：2009-08-28

Applicant: ASML NETHERLANDS BV

Inventor： BHATTACHARYYA KAUSTUVE ,  SCHAAR MAURITS ,  BOEF ARIE ,  KERKHOF MARCUS

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2003294A

公开(公告)日：2010-03-09

申请号：NL2003294

申请日：2009-07-27

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  VERSTAPPEN LEONARDUS

IPC: G01B11/00 ,  G03F9/00

公开(公告)号：NL2011945A

公开(公告)日：2014-07-29

申请号：NL2011945

申请日：2013-12-12

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  OOSTEN ANTON ,  BUTLER HANS ,  LOOPSTRA ERIK ,  WIJST MARC ,  ZAAL KOEN

IPC: G03F7/20 ,  H05G2/00

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.