公开(公告)号：JP2004279405A

公开(公告)日：2004-10-07

申请号：JP2003366656

申请日：2003-09-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DEN BOEF ARIE JEFFREY ,  BORNEBROEK FRANK ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  DUSA MIRCEA ,  VAN HAREN RICHARD JOHANNES FRA ,  KIERS ANTOINE GASTON MARIE ,  KREUZER JUSTIN LLOYD ,  VAN DER SCHAAR MAURITS ,  VAN WIJNEN PAUL JACQUES ,  MOS EVERHARDUS CORNELIS ,  JAGER PIETER WILLEM HERMAN ,  VAN DER LAAN HANS ,  LUEHRMANN PAUL FRANK

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide a device inspection method which has solved the conventional defects. SOLUTION: In the method, an asymmetrical marker on a device to be inspected is included; the form of the asymmetrical marker depends on the parameters to be inspected; a first measurement value of the position of the marker is obtained by directing light at the marker and detecting the diffracted light of a specified wavelength or of a diffracted angle; a secondary measured value of the position of the marker which is obtained by detecting the diffracted light of a different wavelength or at a different diffracted angle; a comparison between the first and second measurement positions which is performed so as to determine a shift indicating the degree of asymmetry of the marker. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG125922A1

公开(公告)日：2006-10-30

申请号：SG200305607

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： BOEF DEN ARIE JEFFREY ,  BORNEBROEK FRANK ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  DUSA MIRCEA ,  HAREN VAN RICHARD JOHANNES FRA ,  KIERS ANTOINE GASTON MARIE ,  KREUZER JUSTIN LLOYD ,  SCHAAR VAN DER MAURITS ,  WIJNEN VAN PAUL JACQUES ,  MOS EVERHARDUS CORNELIS ,  JAGER PIETER WILLEM HERMAN ,  LAAN VAN DER HANS ,  LUEHRMANN PAUL FRANK

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

Abstract: A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via detection of diffracted light of a particular wavelength or diffraction angle, obtaining a second measurement of the position of the marker via detection of diffracted light of a different wavelength or diffraction angle, and comparing the first and second measured positions to determine a shift indicative of the degree of asymmetry of the marker.

公开(公告)号：NL2008701A

公开(公告)日：2012-12-03

申请号：NL2008701

申请日：2012-04-25

Applicant: ASML NETHERLANDS BV

Inventor： WIJNEN PAUL ,  VESELINOVIC PETAR ,  BORNEBROEK FRANK

IPC: G03F7/20

公开(公告)号：DE69817491D1

公开(公告)日：2003-10-02

申请号：DE69817491

申请日：1998-03-02

Applicant: ASML NETHERLANDS BV

Inventor： BORNEBROEK FRANK

IPC: H01L21/027 ,  G03F9/00

Abstract: A lithographic projection apparatus with an off-axis alignment unit for aligning a substrate alignment mark (P1) with respect to a reference (RGP) is described. This unit comprises a structure (WEP) of deflection elements (80-86) which give the sub-beams having different diffraction orders coming from the diffractive substrate mark (P1) different directions so that these sub-beams are incident on separate reference gratings (90-96) and can be detected by separate detectors (DET). This unit also provides the possibility of aligning asymmetrical alignment marks with great accuracy.

公开(公告)号：DE69817491T2

公开(公告)日：2004-06-17

申请号：DE69817491

申请日：1998-03-02

Applicant: ASML NETHERLANDS BV

Inventor： BORNEBROEK FRANK

IPC: H01L21/027 ,  G03F9/00

Abstract: A lithographic projection apparatus with an off-axis alignment unit for aligning a substrate alignment mark (P1) with respect to a reference (RGP) is described. This unit comprises a structure (WEP) of deflection elements (80-86) which give the sub-beams having different diffraction orders coming from the diffractive substrate mark (P1) different directions so that these sub-beams are incident on separate reference gratings (90-96) and can be detected by separate detectors (DET). This unit also provides the possibility of aligning asymmetrical alignment marks with great accuracy.