公开(公告)号：SG123587A1

公开(公告)日：2006-07-26

申请号：SG200307483

申请日：2003-12-15

Applicant: ASML NETHERLANDS BV

Inventor： BOEF DEN ARIE JEFFREY ,  MOS EVERHARDUS CORNELIS ,  SCHAAR VAN DER MAURITS

IPC: G03F7/20 ,  G01B11/00 ,  G03F7/23 ,  G03F9/00 ,  G06F19/00 ,  H01L21/027

Abstract: During device manufacturing, a beam of radiation is projected onto a substrate via a mask. The substrate is aligned with the mask using an alignment structure on the substrate, with properties of the light reflected from (or transmitted by) the alignment structure being used to determine the relative position of the substrate. Earlier processing of the substrate may cause errors in the position determined from the reflected light. In one embodiment of the invention, measurement of properties of the reflected light are used to determine a correction for errors caused by processing of the substrate. Parameters of a physical model of the alignment structure may be estimated from the reflected light and used to determine the correction. Amplitudes of a plurality of different diffraction peaks may be measured to determine the correction.

公开(公告)号：SG128658A1

公开(公告)日：2007-01-30

申请号：SG200604437

申请日：2006-06-29

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR VAN DER MAURITS ,  BOEF DEN ARIE JEFFREY ,  DUSA MIRCEA ,  KIERS ANTOINE GASTON MARIE

公开(公告)号：SG125922A1

公开(公告)日：2006-10-30

申请号：SG200305607

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： BOEF DEN ARIE JEFFREY ,  BORNEBROEK FRANK ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  DUSA MIRCEA ,  HAREN VAN RICHARD JOHANNES FRA ,  KIERS ANTOINE GASTON MARIE ,  KREUZER JUSTIN LLOYD ,  SCHAAR VAN DER MAURITS ,  WIJNEN VAN PAUL JACQUES ,  MOS EVERHARDUS CORNELIS ,  JAGER PIETER WILLEM HERMAN ,  LAAN VAN DER HANS ,  LUEHRMANN PAUL FRANK

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

Abstract: A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via detection of diffracted light of a particular wavelength or diffraction angle, obtaining a second measurement of the position of the marker via detection of diffracted light of a different wavelength or diffraction angle, and comparing the first and second measured positions to determine a shift indicative of the degree of asymmetry of the marker.

公开(公告)号：SG122952A1

公开(公告)日：2006-06-29

申请号：SG200508421

申请日：2005-10-27

Applicant: ASML NETHERLANDS BV

Inventor： BOEF DEN ARIE JEFFREY ,  BURGHOORN JACOBUS ,  DUSA MIRCEA ,  KIERS ANTOINE GASTON MARIE ,  SCHAAR VAN DER MAURITS

公开(公告)号：SG125923A1

公开(公告)日：2006-10-30

申请号：SG200305609

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： HAREN VAN RICHARD JOHANNES FRA ,  HINNEN PAUL CHRISTIAAN ,  LALBAHADOERSING SANJAY ,  MOS EVERHARDUS CORNELIS ,  MEGENS HENRY ,  SCHAAR VAN DER MAURITS ,  HUIJBREGTSE JEROEN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G01D5/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

Abstract: Marker structure on a substrate for optical alignment of said substrate, said marker structure comprising a plurality of first structural elements and a plurality of second structural elements, in use said marker structure allowing said optical alignment based upon providing at least one light beam directed on said marker structure, - detecting light received from said marker structure at a sensor, - determining alignment information from said detected light, said alignment information comprising information relating a position of said substrate to said sensor.