公开(公告)号：JP2006332656A

公开(公告)日：2006-12-07

申请号：JP2006139902

申请日：2006-05-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRINK MARINUS AART VAN DEN ,  BENSCHOP JOZEF PETRUS HENRICUS ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device having a high throughput and that can transfer patterns with relatively small structures on substrates.
SOLUTION: The invention relates to a dual stage lithographic device, in which two substrate stages are constructed to cooperate with each other to perform a joint sweep movement for guiding the lithographic device from a first condition, a condition in which an immersion liquid is confined between a first substrate carried by a first stage of the stages and a final element of the projection system in the device, to a second condition, a condition in which the liquid is confined between a second substrate carried by a second stage of the two stages and the final element, such that during the joint sweep movement, the liquid is confined to be substantially within the described space with respect to the final element.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高通量并可以在基板上以相对小的结构转移图案的光刻设备。 解决方案：本发明涉及一种双级光刻设备，其中两个基板台被构造成彼此配合以执行用于从第一状态引导光刻设备的关节扫掠运动，其中浸没液体 被限制在由第一级承载的第一衬底和装置中的投影系统的最终元件之间，第二条件是将液体限制在由第二级承载的第二衬底 两级和最终元件，使得在联合扫掠运动期间，液体被限制在相对于最终元件基本上在所描述的空间内。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：NL1036474A1

公开(公告)日：2009-08-11

申请号：NL1036474

申请日：2009-01-28

Applicant: ASML NETHERLANDS BV

Inventor： BRINK MARINUS AART VAN DEN ,  BUTLER HANS ,  EUSSEN EMIEL JOZEF MELANIE ,  PASCH ENGELBERTUS ANTONIUS FRANSISCUS VAN DER ,  WIJST MARC WILHELMUS MARIA VAN DER ,  ANGELIS GEORGO ,  KLAVER RENATUS GERARDUS ,  HAMERS MARTIJN ROBERT ,  VERHAAR BOUDEWIJN THEODORUS ,  HOEKSTRA PETER

IPC: G03F7/20