公开(公告)号：JP2011187930A

公开(公告)日：2011-09-22

申请号：JP2010278879

申请日：2010-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  FAHRNI FRANCIS ,  JOSEPH KEIJSERS GERARDUS J ,  MULDER HEINE MELLE ,  PONGERS WILLEM RICHARD ,  HAGEMAN JOOST CYRILLUS LAMBERT ,  VAN BRUGGEN MATTHEUS JOHANNES ,  ROOSEKRANS JOHANNES FRANCISCUS ,  BUTLER DAVID JAMES ,  THOMASSEN PATRICK MARCEL MARIA ,  PAEVA GABRIELA VESSELINOVA

IPC: H01L21/027

CPC classification number: G03B27/54

Abstract: PROBLEM TO BE SOLVED: To solve such a problem in a prior art that, after each scanning operation, the direction of mask scanning operation and the direction of substrate scanning operation are reversed and a substrate is moved even across the scanning direction, thus consuming a time. SOLUTION: A lithography apparatus includes an illumination system. The illumination system is arranged to provide a first radiation beam forming a first mask illumination zone and at the same time, and to provide a second radiation beam forming a second mask illumination zone. The first and second mask illumination zones are arranged to illuminate the same mask at the same time. The lithography apparatus also includes a light projection system. The projection system projects the first radiation beam so as to form a first substrate illumination zone and at the same time, and projects the second radiation beam so as to form a second substrate illumination zone. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 解决的问题为了解决现有技术中的这样一个问题，即在每次扫描操作之后，掩模扫描操作的方向和基板扫描操作的方向相反，并且基板在扫描方向上移动， 从而消耗时间。 解决方案：光刻设备包括照明系统。 照明系统被布置成提供形成第一掩模照明区域并同时提供形成第二掩模照射区域的第二辐射束的第一辐射束。 第一和第二掩模照明区域被布置成同时照射相同的掩模。 光刻设备还包括光投射系统。 投影系统投射第一辐射束，以形成第一衬底照明区，同时投射第二辐射束，以形成第二衬底照明区。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2006279A

公开(公告)日：2011-09-06

申请号：NL2006279

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES ,  THOMASSEN PATRICK MARCEL MARIA ,  PAEVA GABRIELA VESSELINOVA ,  FAHRNI FRANCIS ,  KEIJSERS GERARDUS ,  MULDER HEINE ,  PONGERS WILLEM ,  HAGEMAN JOOST ,  BRUGGEN MATTHEUS JOHANNES ,  ROOSEKRANS JOHANNES FRANSISCUS ,  BUTLER DAVID JAMES

IPC: G03F7/20

Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.