公开(公告)号：NL2010262A

公开(公告)日：2013-09-10

申请号：NL2010262

申请日：2013-02-07

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES ,  JASPER JOHANNES

IPC: G03F7/20

公开(公告)号：NL2010467A

公开(公告)日：2013-10-17

申请号：NL2010467

申请日：2013-03-18

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES

IPC: G03F7/20

公开(公告)号：NL2008310A

公开(公告)日：2012-10-08

申请号：NL2008310

申请日：2012-02-17

Applicant: ASML NETHERLANDS BV

Inventor： ZHANG SHAOXIAN ,  BASELMANS JOHANNES ,  JASPER JOHANNES

IPC: G03F7/20

公开(公告)号：NL2006279A

公开(公告)日：2011-09-06

申请号：NL2006279

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES ,  THOMASSEN PATRICK MARCEL MARIA ,  PAEVA GABRIELA VESSELINOVA ,  FAHRNI FRANCIS ,  KEIJSERS GERARDUS ,  MULDER HEINE ,  PONGERS WILLEM ,  HAGEMAN JOOST ,  BRUGGEN MATTHEUS JOHANNES ,  ROOSEKRANS JOHANNES FRANSISCUS ,  BUTLER DAVID JAMES

IPC: G03F7/20

Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.