公开(公告)号：NL2006279A

公开(公告)日：2011-09-06

申请号：NL2006279

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES ,  THOMASSEN PATRICK MARCEL MARIA ,  PAEVA GABRIELA VESSELINOVA ,  FAHRNI FRANCIS ,  KEIJSERS GERARDUS ,  MULDER HEINE ,  PONGERS WILLEM ,  HAGEMAN JOOST ,  BRUGGEN MATTHEUS JOHANNES ,  ROOSEKRANS JOHANNES FRANSISCUS ,  BUTLER DAVID JAMES

IPC: G03F7/20

Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.