公开(公告)号：NL2006625A

公开(公告)日：2011-11-29

申请号：NL2006625

申请日：2011-04-19

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  MULDER HEINE ,  VEEN PAUL ,  ENDENDIJK WILFRED ,  BOUMAN WILLEM ,  DRIEENHUIZEN BERT ,  VERBEECK JOZEF ,  DASSEN MARC ,  HOLLINK THIJS

IPC: G03F7/20

公开(公告)号：NL2009168A

公开(公告)日：2013-02-21

申请号：NL2009168

申请日：2012-07-11

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE ,  HANSEN STEVEN ,  HOLLINK THIJS

IPC: G03F7/20

Abstract: A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.

公开(公告)号：NL2012052A

公开(公告)日：2014-08-04

申请号：NL2012052

申请日：2014-01-07

Applicant: ASML NETHERLANDS BV

Inventor： SMEETS DRIES ,  BLEEKER ARNO ,  LEE CHRIS ,  JAGER PIETER ,  MULDER HEINE ,  PELLENS RUDY

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2010176A

公开(公告)日：2013-08-26

申请号：NL2010176

申请日：2013-01-24

Applicant: ASML NETHERLANDS BV

Inventor： KOEK WOUTER ,  BLEEKER ARNO ,  LOOPSTRA ERIK ,  MULDER HEINE ,  ZWET ERWIN ,  SMEETS DRIES ,  EBELING ROBERT

IPC: G03F7/20

公开(公告)号：NL2009342A

公开(公告)日：2013-05-07

申请号：NL2009342

申请日：2012-08-22

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE

IPC: G03F7/20

公开(公告)号：NL2007303A

公开(公告)日：2012-03-26

申请号：NL2007303

申请日：2011-08-26

Applicant: ASML NETHERLANDS BV

Inventor： HANSEN STEVEN ,  CHIOU TSANN-BIM ,  MULDER HEINE

IPC: G03F7/20

公开(公告)号：NL2010761A

公开(公告)日：2013-12-04

申请号：NL2010761

申请日：2013-05-07

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE ,  JAGER PIETER

IPC: G03F7/20

公开(公告)号：NL2006279A

公开(公告)日：2011-09-06

申请号：NL2006279

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES ,  THOMASSEN PATRICK MARCEL MARIA ,  PAEVA GABRIELA VESSELINOVA ,  FAHRNI FRANCIS ,  KEIJSERS GERARDUS ,  MULDER HEINE ,  PONGERS WILLEM ,  HAGEMAN JOOST ,  BRUGGEN MATTHEUS JOHANNES ,  ROOSEKRANS JOHANNES FRANSISCUS ,  BUTLER DAVID JAMES

IPC: G03F7/20

Abstract: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.

公开(公告)号：NL2010771A

公开(公告)日：2013-12-10

申请号：NL2010771

申请日：2013-05-08

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE ,  SCHUURMANS FRANK ,  ZWET ERWIN

IPC: G03F7/20

公开(公告)号：NL2010204A

公开(公告)日：2013-10-15

申请号：NL2010204

申请日：2013-01-30

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  CASTENMILLER THOMAS ,  JAGER PIETER ,  MULDER HEINE ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  PHILIPS DANNY ,  BEERENS RUUD ,  TIMMERMANS ROGER

IPC: G03F7/20 ,  H01L21/68

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.