公开(公告)号：SG153763A1

公开(公告)日：2009-07-29

申请号：SG2008092165

申请日：2008-12-10

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAN WAGNER ,  CORTIE ROGIER HENDRIKUS MAGDALENA

IPC: G03F7/20 ,  H01L21/20 ,  H01L21/36

Abstract: A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid. [Fig. 6B]

公开(公告)号：NL2025559A

公开(公告)日：2020-12-03

申请号：NL2025559

申请日：2020-05-12

Applicant: ASML NETHERLANDS BV

Inventor： MARCUS ADRIANUS VAN DE KERKHOF ,  MARTIJN GRAM ,  HENDRICUS JOHANNES MARIA MEIJER ,  JOHANNES ARIE VAN DEN BROEK ,  CHRISTIAN WAGNER

IPC: G03F7/20

Abstract: A lithographic apparatus operable to provide a plurality of target areas of a substrate with a nominal dose of radiation and an associate method are described. The nominal dose of radiation is provided to each of the plurality of target areas of the substrate across a number of exposures. Providing the nominal dose of radiation to each target area involves exposing a first portion of the target area to radiation while a second portion of the target area is not exposed to radiation (the shape and configuration of the first and second portions being dependent on a pattern being imaged). The number of exposures for each target area is determined in dependence on data describing mechanical behaviour of that target area of the substrate in response to receipt of a thermal load. The thermal load may correspond to a thermal load received when the first portion of the target area is provided with the nominal dose of radiation.