公开(公告)号：KR20210009445A

公开(公告)日：2021-01-26

申请号：KR20217001688

申请日：2017-08-28

Applicant: ASML NETHERLANDS BV

Inventor： VAN DEN EIJNDEN PEPIJN ,  ROPS CORNELIUS MARIA ,  POLET THEODORUS WILHELMUS ,  KEUKENS FLOOR LODEWIJK ,  TANASA GHEORGHE ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  CUYPERS KOEN ,  BUDDENBERG HAROLD SEBASTIAAN ,  GATTOBIGIO GIOVANNI LUCA ,  VAN VLIET EVERT ,  TEN KATE NICOLAAS ,  FRENCKEN MARK JOHANNES HERMANUS ,  VAN ERVE JANTIEN LAURA ,  TEUNISSEN MARCEL MARIA CORNELIUS FRANCISCUS

IPC: G03F7/20

Abstract: 침지유체를리소그래피장치의일부영역에국한시키도록구성된유체처리구조물(12)은, 침지액체를통해투영비임이통과하도록형성된구멍(15); 제 1 부분(100); 및제 2 부분(200)을포함하고, 제 1 부분과제 2 부분중의적어도하나는영역으로부터침지유체를빼내기위한표면(20)을형성하고, 유체처리구조물은유체처리구조물의표면에출입하는유체유동을제공하고, 제 2 부분에대한제 1 부분의운동은구멍에대한표면에출입하는유체유동의위치를변화시키는데효과적이고, 제 1 부분과제 2 부분중의하나는유체유동이통과하는적어도하나의관통공(51, 61)을포함하고, 제 1 부분과제 2 부분중의다른하나는유체유동이통과하는적어도하나의개구(55, 65)를포함하며, 적어도하나의관통공및 적어도하나의개구는서로정렬되면유체연통하고, 운동에의해적어도하나의개구가적어도하나의관통공중의하나와정렬되어, 구멍에대한표면에출입하는유체유동의위치가변하게된다.

公开(公告)号：JP2011176308A

公开(公告)日：2011-09-08

申请号：JP2011025713

申请日：2011-02-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  VAN DER GRAAF SANDRA ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  KANEKO TAKESHI ,  DZIOMKINA NINA VLADIMIROVNA ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID ,  ROPS CORNELIUS MARIA ,  VERDONCK ADRIANUS MARINUS ,  KATE NICOLAAS TEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure for minimizing or preventing the sealing of bubbles within an immersion solution of an immersion lithographic apparatus. SOLUTION: A fluid handling structure is for a lithographic apparatus. At a boundary from a space configured to include an immersion fluid to a region external to the fluid handling structure, the fluid handling structure successively has an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种流体处理结构，用于使浸没式光刻设备的浸液中的气泡密封最小化或防止。 解决方案：流体处理结构用于光刻设备。 在从被构造为将浸没流体包括在流体处理结构外部的区域的空间的边界处，流体处理结构依次具有提取器，其具有布置在第一线中的至少一个开口，在使用中，至少一个开口指向基板 和/或在使用中面向基底和/或台面的表面上的桌子和液体操纵器，以减少表面上的液滴的聚结机会。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071511A

公开(公告)日：2011-04-07

申请号：JP2010207523

申请日：2010-09-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS R ,  HUBERTUS MULKENS JOHANNES C ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  MEIJERS RALPH JOSEPH ,  FABRIZIO EVANGELISTA

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system that maintains a liquid in a space between a final element of a projection system and a substrate.
SOLUTION: The fluid handling structure for a lithographic apparatus includes, at a boundary between the space in which an immersion fluid is confined and an external region of the fluid handling structure: a first gas knife device having a plurality of openings arranged in a first column and an aperture in a second column; and a second gas knife device having one or a plurality of openings in a third array and an aperture in a fourth column.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在投影系统的最终元件和基板之间的空间中保持液体的流体处理系统。 解决方案：用于光刻设备的流体处理结构在其中限定浸没流体的空间与流体处理结构的外部区域之间的边界处包括：具有多个开口的第一气刀装置 第一列和第二列中的孔; 以及具有第三阵列中的一个或多个开口和第四列中的孔的第二气刀装置。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011187954A

公开(公告)日：2011-09-22

申请号：JP2011039323

申请日：2011-02-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  RIEPEN MICHEL ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52

Abstract: PROBLEM TO BE SOLVED: To reduce or remove the risk of focusing defects, and to maintain or increase throughput. SOLUTION: A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the handling structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：减少或消除聚焦缺陷的风险，并维持或提高吞吐量。 解决方案：用于光刻设备的液体处理结构包括液滴控制器，其被配置为允许浸没液滴从处理结构中丢失并防止液滴与限制浸没液体的弯月面碰撞。 液滴控制器可以包括布置成重叠以阻挡进入的液滴的气刀。 在气刀之间可能存在排列有间隙的抽出孔，以提取通过间隙的液体。 允许液滴通过间隙逃逸。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：SG175498A1

公开(公告)日：2011-11-28

申请号：SG2011020534

申请日：2011-03-22

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER HENDRIKUS MAGDALENA ,  LIEBREGTS PAULUS MARTINUS MARIA ,  RIEPEN MICHEL ,  EVANGELISTA FABRIZIO

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.[Figure 1]

公开(公告)号：NL2006054A

公开(公告)日：2011-08-10

申请号：NL2006054

申请日：2011-01-24

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  ROPS CORNELIUS ,  VERDONCK ADRIANUS MARINUS ,  EUMMELEN ERIK ,  GRAAF SANDRA ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  KANEKO TAKESHI ,  DZIOMKINA NINA ,  BOKHOVEN LAURENTIUS ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID

IPC: G03F7/20

公开(公告)号：SG153763A1

公开(公告)日：2009-07-29

申请号：SG2008092165

申请日：2008-12-10

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAN WAGNER ,  CORTIE ROGIER HENDRIKUS MAGDALENA

IPC: G03F7/20 ,  H01L21/20 ,  H01L21/36

Abstract: A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid. [Fig. 6B]