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    Lithographic apparatus and position sensor
    1.
    发明专利
    Lithographic apparatus and position sensor 审中-公开
    地平面设备和位置传感器

    公开(公告)号：JP2009021590A

    公开(公告)日：2009-01-29

    申请号：JP2008175140

    申请日：2008-07-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN BRUGGEN OLAF HUBERTUS WILH ,  AUER FRANK ,  MARCEL KOENRAAD MARIE BAGGEN ,  VAN DER MEULEN FRITS ,  VOGELSANG PATRICK DAVID ,  REIJNEN MARTINUS CORNELIS ,  DASSEL JOHANNES ROLAND ,  NIHTIANOV STOYAN ,  WAKKER REMKO ,  ZUTPHEN TOM VAN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70758 ,  G01D5/145 ,  G01D5/2451 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a safety system for preventing a collision of a support with another parts, for a lithographic apparatus which has a stationary magnet motor for driving the support such as a substrate support or a patterning device support. SOLUTION: A measurement system for measuring the position of the support. The measurement system measures a magnetic field strength of an alternating magnetic field generated by a magnet assembly of the stationary magnet motor, and/or measures generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measures light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于防止支撑件与另一部件碰撞的安全系统，用于具有用于驱动诸如基板支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备。

    解决方案：用于测量支架位置的测量系统。 测量系统测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度和/或测量在屏蔽磁体组件的金属层中的涡流的产生以及产生电磁体的电感测量 导致涡流的交变磁场，和/或使用诸如位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。 版权所有（C）2009，JPO＆INPIT

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