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    Lithographic apparatus, device manufacturing apparatus, device manufactured by the apparatus, and controllable patterning apparatus using spatial light modulator by distributed digital-to-analog conversion
    2.
    发明专利
    Lithographic apparatus, device manufacturing apparatus, device manufactured by the apparatus, and controllable patterning apparatus using spatial light modulator by distributed digital-to-analog conversion 有权
    设备制造设备，装置制造的装置以及使用分布式数字到模拟转换的空间光调制器的可控制图案装置

    公开(公告)号：JP2010045381A

    公开(公告)日：2010-02-25

    申请号：JP2009224795

    申请日：2009-09-29

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MARIA ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILLHELMUS JOSEPHUS MARIA ,  KAMEN HRISTOV CHILOV

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that utilize efficient patterning means. SOLUTION: The present invention includes a lithographic apparatus and a device manufacturing method that uses a patterning apparatus that increases the number of individually controllable elements to be simultaneously programmed, in order to increase the update speed of an array of the individually controllable elements. Thus, the number of high-speed analog inputs required for the array is decreased, the complexity of the array is reduced, and the maximum update speed of the array is increased. Furthermore, the number of elements in the array can be increased easily. The patterning apparatus is divided into a plurality of cell groups, and the lithographic apparatus may include a plurality of supply channels. Each supply channel is disposed such that it supplies a voltage signal to each cell that corresponds to the cell group. Thus, the required number of inputs to the patterning apparatus for individually addressing each cell is reduced. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种利用有效的图案形成装置的系统和方法。 解决方案：本发明包括使用增加可同时编程的独立可控元件的数量的图案形成装置的光刻设备和设备制造方法，以便增加独立可控元件阵列的更新速度 。 因此，阵列所需的高速模拟输入的数量减少，阵列的复杂度降低，阵列的最大更新速度增加。 此外，阵列中的元素的数量可以容易地增加。 图案形成装置被分成多个单元组，并且光刻设备可以包括多个供电通道。 每个供应通道被布置成使得其向与单元组对应的每个单元提供电压信号。 因此，减少了用于单独寻址每个单元的图案形成装置所需的输入数量。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and position sensor
    3.
    发明专利
    Lithographic apparatus and position sensor 审中-公开
    地平面设备和位置传感器

    公开(公告)号：JP2009021590A

    公开(公告)日：2009-01-29

    申请号：JP2008175140

    申请日：2008-07-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN BRUGGEN OLAF HUBERTUS WILH ,  AUER FRANK ,  MARCEL KOENRAAD MARIE BAGGEN ,  VAN DER MEULEN FRITS ,  VOGELSANG PATRICK DAVID ,  REIJNEN MARTINUS CORNELIS ,  DASSEL JOHANNES ROLAND ,  NIHTIANOV STOYAN ,  WAKKER REMKO ,  ZUTPHEN TOM VAN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70758 ,  G01D5/145 ,  G01D5/2451 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a safety system for preventing a collision of a support with another parts, for a lithographic apparatus which has a stationary magnet motor for driving the support such as a substrate support or a patterning device support. SOLUTION: A measurement system for measuring the position of the support. The measurement system measures a magnetic field strength of an alternating magnetic field generated by a magnet assembly of the stationary magnet motor, and/or measures generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measures light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于防止支撑件与另一部件碰撞的安全系统，用于具有用于驱动诸如基板支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备。

    解决方案：用于测量支架位置的测量系统。 测量系统测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度和/或测量在屏蔽磁体组件的金属层中的涡流的产生以及产生电磁体的电感测量 导致涡流的交变磁场，和/或使用诸如位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。 版权所有（C）2009，JPO＆INPIT

    Level sensor, method for determining height map of substrate, and lithographic apparatus
    4.
    发明专利
    Level sensor, method for determining height map of substrate, and lithographic apparatus 有权
    水平传感器，确定基板高度映射的方法和平面设备

    公开(公告)号：JP2013110398A

    公开(公告)日：2013-06-06

    申请号：JP2012234536

    申请日：2012-10-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KHUAT DUY LAURENT ,  REIJNEN MARTINUS CORNELIS ,  LUKASZ JERZY MACHT ,  KOOP ERIK JOHAN

    IPC: H01L21/027 ,  G01B11/00 ,  G03F7/207 ,  H01L21/68

    CPC classification number: G01B11/00 ,  G01B11/0608 ,  G03B27/34 ,  G03F9/7034

    Abstract: PROBLEM TO BE SOLVED: To provide a level sensor technique that provides more flexibility and/or efficiency in determining a height level of a substrate surface.SOLUTION: A level sensor configured to determine a height level of a surface of a substrate W includes a detection unit arranged to receive a measurement beam after reflection on the substrate W. The detection unit includes an array of detection elements arranged so that each of the detection elements receives a part of the measurement beam reflected on a measurement subarea 8a of measurement areas 81, 82, 83, and 84, and is configured to provide a measurement signal on the basis of the part of the measurement beam received by the respective detection element. A processing unit is configured to calculate, in accordance with a selected resolution at the measurement subarea 8a, a height level of the measurement subarea 8a, or to calculate a height level of a combination of multiple measurement subareas 8a.

    Abstract translation: 要解决的问题：提供一种水平传感器技术，其在确定衬底表面的高度水平方面提供更多的灵活性和/或效率。 解决方案：被配置为确定衬底W的表面的高度水平的液位传感器包括检测单元，其布置成在衬底W上反射之后接收测量光束。检测单元包括检测元件阵列， 每个检测元件接收在测量区域81,82,83和84的测量子区域8a上反射的测量光束的一部分，并且被配置为基于由测量区域81,82,83和84接收到的测量光束的部分来提供测量信号 相应的检测元件。 处理单元被配置为根据测量子区域8a中的所选分辨率计算测量子区域8a的高度水平，或者计算多个测量子区域8a的组合的高度水平。 版权所有（C）2013，JPO＆INPIT

    Optical position sensor, position detector, lithographic apparatus and method for determining absolute position of movable object to be used in relative position measurement system
    5.
    发明专利
    Optical position sensor, position detector, lithographic apparatus and method for determining absolute position of movable object to be used in relative position measurement system 有权
    光学位置传感器，位置检测器，光刻设备和确定相对位置测量系统中使用的可移动物体的绝对位置的方法

    公开(公告)号：JP2010050448A

    公开(公告)日：2010-03-04

    申请号：JP2009175962

    申请日：2009-07-29

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VOGELSANG PATRICK DAVID ,  REIJNEN MARTINUS CORNELIS ,  VAN ZUTPHEN TOM

    IPC: H01L31/10 ,  G01B11/00 ,  H01L21/027

    CPC classification number: H01L31/02024 ,  G03F7/70775 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To provide a reference sensor with improved stability in time and temperature.
    SOLUTION: The sensor includes a semiconductor body having a top surface and a bottom surface, a first doped surface oriented region of a first conductivity type at the top surface, and a second doped surface oriented region of an opposite second conductivity type at the bottom surface, wherein a sensitive area is defined in a way that a first region overlaps with a second region. A resistive layer is partially arranged in the sensitive area. The sensor includes two first contact electrodes and two second contact electrodes, wherein the first contact electrodes are placed on the resistive layer to define a first detection area in the sensitive area between the first contact electrodes, and the second contact electrodes are placed partially in the sensitive area on the bottom surface of the body, and the surfaces of the second electrodes in the sensitive area define a second detection area that overlaps with the first detection area.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供具有改进的时间和温度稳定性的参考传感器。 解决方案：传感器包括具有顶表面和底表面的半导体本体，在顶表面处具有第一导电类型的第一掺杂表面取向区域和相对第二导电类型的第二掺杂表面取向区域 底表面，其中以第一区域与第二区域重叠的方式限定敏感区域。 电阻层部分地布置在敏感区域中。 传感器包括两个第一接触电极和两个第二接触电极，其中第一接触电极被放置在电阻层上以限定第一接触电极之间的敏感区域中的第一检测区域，并且第二接触电极部分放置在 在身体的底表面上的敏感区域，并且敏感区域中的第二电极的表面限定与第一检测区域重叠的第二检测区域。 版权所有（C）2010，JPO＆INPIT

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