公开(公告)号：JP2008300836A

公开(公告)日：2008-12-11

申请号：JP2008140391

申请日：2008-05-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SMEETS ERIK MARIE JOSE ,  WAKKER REMKO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70216

Abstract: PROBLEM TO BE SOLVED: To prevent a mask material that is provided on a substrate table for the purpose of preventing exposure of a peripheral region of a substrate from being directly exposed to a photosensitive surface to cause dusts to drop onto a wafer.
SOLUTION: A mask 116 provided on the substrate table 102 is attached to a movable carrier 112. The movable carrier has a moving range in which the movable carrier at least partially circumnavigates the substrate table. The mask has a ring with an internal diameter larger than the outer shape of the substrate. The ring is configured to be able to move from a position lying on the substrate to a position hanging over the peripheral exposure region of the substrate.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了防止设置在基板台上的掩模材料，以防止基板的周边区域暴露于光敏表面以使灰尘落在晶片上。 解决方案：设置在基板台102上的掩模116附接到可移动载体112.可移动载体具有可移动载体至少部分地环绕基板台的移动范围。 掩模具有内径大于基板外形的环。 环被配置为能够从位于基板上的位置移动到悬挂在基板的周边曝光区域上的位置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2013042157A

公开(公告)日：2013-02-28

申请号：JP2012220645

申请日：2012-10-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RENE THEODORUS PETRUS COMPEN ,  VOZNYI OLEG ,  HOUBEN MARTIJN ,  BOUCHAIBI MAJID EL ,  BOEKHOLT FRANCISCUS JOHANNES MARIA ,  WAKKER REMKO

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70783 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a substrate clamp system and a lithographic device capable of avoiding stress guided by particles and/or heat in a substrate and improving pattern transfer accuracy.SOLUTION: A lithographic device configured so as to transfer a pattern from a patterning device to a substrate W includes: a substrate table configured so as to hold the substrate; a first clamp system 40, 128 configured so as to clamp the substrate table to a substrate table support structure; and a second clamp system 40, 129 configured so as to clamp the substrate to the substrate table after the substrate table is clamped to the substrate table support structure.

Abstract translation: 要解决的问题：提供一种能够避免由基板中的颗粒和/或热引起的应力的基板夹紧系统和光刻装置，并提高图案转印精度。 解决方案：构造成将图案从图案形成装置传送到基板W的光刻装置包括：被配置为保持基板的基板台; 被配置为将衬底台夹持到衬底台支撑结构的第一夹紧系统40,128; 以及第二夹紧系统40,129，其被配置为在将基板台夹紧到基板台支撑结构之后将基板夹紧到基板台。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2009021590A

公开(公告)日：2009-01-29

申请号：JP2008175140

申请日：2008-07-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN BRUGGEN OLAF HUBERTUS WILH ,  AUER FRANK ,  MARCEL KOENRAAD MARIE BAGGEN ,  VAN DER MEULEN FRITS ,  VOGELSANG PATRICK DAVID ,  REIJNEN MARTINUS CORNELIS ,  DASSEL JOHANNES ROLAND ,  NIHTIANOV STOYAN ,  WAKKER REMKO ,  ZUTPHEN TOM VAN

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70758 ,  G01D5/145 ,  G01D5/2451 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a safety system for preventing a collision of a support with another parts, for a lithographic apparatus which has a stationary magnet motor for driving the support such as a substrate support or a patterning device support. SOLUTION: A measurement system for measuring the position of the support. The measurement system measures a magnetic field strength of an alternating magnetic field generated by a magnet assembly of the stationary magnet motor, and/or measures generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measures light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于防止支撑件与另一部件碰撞的安全系统，用于具有用于驱动诸如基板支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备。

解决方案：用于测量支架位置的测量系统。 测量系统测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度和/或测量在屏蔽磁体组件的金属层中的涡流的产生以及产生电磁体的电感测量 导致涡流的交变磁场，和/或使用诸如位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008258634A

公开(公告)日：2008-10-23

申请号：JP2008098423

申请日：2008-04-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WAKKER REMKO ,  SMEETS ERIK MARIE JOSE

IPC: H01L21/027

CPC classification number: G03F7/70741 ,  G03F7/70725 ,  Y10S414/135

Abstract: PROBLEM TO BE SOLVED: To eliminate or reduce contaminating a photosensitive surface of a substrate by falling of particulates onto a substrate, when a mask is loaded, which mechanically masks the substrate and forms an region excluded from exposure.
SOLUTION: This method removes the substrate from a substrate table of a lithography device. The mask for forming a periphery region excluded from exposure on the substrate is provided on the substrate table. The method includes moving the mask from a using position to an storage position. The storage position adjoins a projection system of the lithography device. Moreover, the method includes removing the substrate from the lithography device.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了消除或减少通过将颗粒落到基板上而污染基板的感光表面，当加载掩模时，机械地掩蔽基板并形成不被曝光的区域。 解决方案：该方法从光刻设备的衬底台移除衬底。 在衬底台上设置用于形成在衬底上不被暴露的外围区域的掩模。 该方法包括将掩模从使用位置移动到存储位置。 存储位置邻接光刻设备的投影系统。 此外，该方法包括从光刻设备中去除衬底。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007311787A

公开(公告)日：2007-11-29

申请号：JP2007123107

申请日：2007-05-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RENE THEODORUS PETRUS COMPEN ,  VOZNYI OLEG ,  HOUBEN MARTIJN ,  BOUCHAIBI MAJID EL ,  BOEKHOLT FRANCISCUS JOHANNES M ,  WAKKER REMKO

IPC: H01L21/027 ,  H01L21/683

CPC classification number: G03F7/70783 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can avoid stress guided by particles and heat in a substrate and can improve precision of pattern transcription. SOLUTION: This lithographic apparatus comprises a support structure MT connected with a primary positioner PM, which is configured to support a lighting system (illuminator) IL configured to adjust radiation beam B and a patterning device MA, and also to correctly position the patterning device according to a specific parameter; a substrate table WT that can connect with a secondary positioner PW, which is configured to correctly position the substrate W according to a specific parameter; and a projection system PS that is configured to project a pattern given to the radiation beam B by the patterning device MA to the target portion C of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以避免由基质引起的颗粒和热引起的应力的光刻设备，并且可以提高图案转录的精度。 解决方案：该光刻设备包括与初级定位器PM连接的支撑结构MT，其构造成支撑被配置为调节辐射束B的照明系统（照明器）IL和图案形成装置MA，并且还正确地定位 图案形成装置根据具体参数; 能够与辅助定位器PW连接的基板台WT，其被构造成根据特定参数正确定位基板W. 以及投影系统PS，其被配置为将由图案形成装置MA向辐射束B施加的图案投影到基板W的目标部分C.版权所有（C）2008，JPO＆INPIT

公开(公告)号：NL1035665A1

公开(公告)日：2009-01-13

申请号：NL1035665

申请日：2008-07-04

Applicant: ASML NETHERLANDS BV

Inventor： BRUGGEN OLAF HUBERTUS WILHELMUS VAN ,  AUER FRANK ,  BAGGEN MARCEL KOENRAAD MARIE ,  MEULEN FRITS VAN DER ,  VOGELSANG PATRICK DAVID ,  REIJNEN MARTINUS CORNELIS ,  DASSEL JOHANNES ROLAND ,  NIHTIANOV STOYAN ,  WAKKER REMKO ,  ZUTPHEN TOM VAN

IPC: G03F7/20 ,  H01L21/027