公开(公告)号：DE602005018150D1

公开(公告)日：2010-01-21

申请号：DE602005018150

申请日：2005-10-14

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  DE JONG FREDERICK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS

IPC: G03F7/20 ,  H01L21/00

Abstract: A lithographic apparatus includes a substrate support (2) that is constructed to support a substrate (6), and a projection system (4) that is configured to project a patterned radiation beam (5) onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory (7) of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration (1) for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.