中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

11 records (took 0.03 seconds)

    Calibration substrate and method for calibrating lithographic apparatus
    1.
    发明专利
    Calibration substrate and method for calibrating lithographic apparatus 有权
    校准基板和校准光刻设备的方法

    公开(公告)号：JP2006165576A

    公开(公告)日：2006-06-22

    申请号：JP2005353307

    申请日：2005-12-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE JONG FREDERICK E ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70516 ,  G03F7/70616

    Abstract: PROBLEM TO BE SOLVED: To provide a calibration method for a lithographic projection apparatus that is not substantially affected by temperature variations thereof, and a calibration substrate used for the calibration. SOLUTION: The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate is made of a material having a small thermal expansion coefficient of, for example less than about 1.0×10 -6 K -1 , to reduce deformation thereof due to temperature variations of the substrate. The method for the calibration includes imaging a marker provided on a patterning device onto a target position of the calibration substrate with a beam of radiation, measuring a property of the image of the marker on the calibration substrate, determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus, and adjusting at least one of the operating parameters of the apparatus to correct the error. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种基本上不受其温度变化影响的光刻投影设备的校准方法和用于校准的校准基板。 解决方案：校准基板包括第一基本上平坦的表面，基本平行于第一表面的第二基本上平坦的表面，以及将第一表面连接到第二表面的边缘。 校准基板由热膨胀系数小，例如小于约1.0×10 -6 / SP> K -1 的材料制成，以减少由于 基板的温度变化。 用于校准的方法包括使用辐射束将设置在图案形成装置上的标记物设置在校准基板的目标位置上，测量校准基板上的标记的图像的性质，确定测量的属性和 基于装置的标记和操作参数的预期属性，以及调整装置的操作参数中的至少一个以校正误差。 版权所有（C）2006，JPO＆NCIPI

    Lithography method
    5.
    发明专利
    Lithography method 有权
    LITHOGRAPHY方法

    公开(公告)号：JP2007088455A

    公开(公告)日：2007-04-05

    申请号：JP2006237516

    申请日：2006-09-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  DE KORT ANTONIUS J ,  DE JONG FREDERIK E ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  PEN HERMEN F

    IPC: H01L21/027 ,  G03F9/00

    CPC classification number: G03F7/70633 ,  G03F7/70341 ,  G03F7/7045 ,  G03F7/70458

    Abstract: PROBLEM TO BE SOLVED: To solve a problem of an overlay error by substrate cooling action connected with the vaporization of high refractive index liquid which exists on a substrate. SOLUTION: In the calibration of overlay property, position error data of a first set is obtained by carrying out the exposure of a first substrate (S1) during a first test exposure sequence using a test structure of the first set and measuring the test structure (S2). Then, the identical substrate (S3) is exposed to the test structure of a second set identical to the first set during a second test exposure sequence using a second course which is equivalent to the first course but in which movement is caused in a reverse direction state. The error data of the second set is obtained by measuring the structure of the second set (S4). Influence by wafer cooling can be removed by using these two data sets. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：通过与存在于​​基板上的高折射率液体的蒸发相关的基板冷却动作来解决重叠误差的问题。 解决方案：在叠加属性的校准中，通过使用第一组的测试结构在第一测试曝光序列期间执行第一衬底（S1）的曝光来获得第一组的位置误差数据，并且测量 测试结构（S2）。 然后，在第二测试曝光序列期间，将相同的基板（S3）暴露于与第一组相同的第二组的测试结构，该测试结构使用等同于第一过程的第二过程，但是在相反方向上发生移动 州。 通过测量第二组的结构（S4）获得第二组的误差数据。 通过使用这两个数据集可以消除晶片冷却的影响。 版权所有（C）2007，JPO＆INPIT

    Lithography equipment and device manufacturing method
    6.
    发明专利
    Lithography equipment and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006128682A

    公开(公告)日：2006-05-18

    申请号：JP2005310028

    申请日：2005-10-25

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  VAN GOMPEL EDWIN AUGUSTINUS MA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: H01L21/67109 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment and a device manufacturing method.
    SOLUTION: Lithography equipment has a substrate support formed such that it supports a substrate, and a projection system formed such that it projects a patterned radiation beam to a target part of the substrate. The substrate support is operated such that the substrate is moved along a specified path of the target part as the next target of the substrate. The substrate support has a duct fabric for thermally stabilizing the substrate. This duct fabric supplies a thermal stabilization medium to the substrate through the duct, and removes the thermal stabilization medium virtually using the duct from a portion of the substrate support that supports the target part via the substrate support part that supports the target part preceding the substrate, thereby maintaining the target part as a next target thermally stably.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：平版印刷设备具有形成为支撑基板的基板支撑件和形成为使得其将图案化的辐射束投影到基板的目标部分的投影系统。 操作基板支撑件，使得基板沿着目标部件的指定路径移动，作为基板的下一个目标。 衬底支撑件具有用于热稳定衬底的管道织物。 这种管道织物通过管道向基底提供热稳定介质，并且通过经由基板支撑部分支撑目标部分的衬底支撑部分，基本上使用来自支撑目标部分的基板支撑件的管道的热稳定介质， 从而热稳定地将目标部分保持为下一个目标。 版权所有（C）2006，JPO＆NCIPI

    8.
    发明专利
    未知

    公开(公告)号：DE602005018150D1

    公开(公告)日：2010-01-21

    申请号：DE602005018150

    申请日：2005-10-14

    Applicant: ASML NETHERLANDS BV

    Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  DE JONG FREDERICK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS

    IPC: G03F7/20 ,  H01L21/00

    Abstract: A lithographic apparatus includes a substrate support (2) that is constructed to support a substrate (6), and a projection system (4) that is configured to project a patterned radiation beam (5) onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory (7) of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration (1) for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

    Lithographic apparatus and device manufacturing method
    10.
    发明专利
    Lithographic apparatus and device manufacturing method 未知

    公开(公告)号：SG122045A1

    公开(公告)日：2006-05-26

    申请号：SG200508465

    申请日：2005-10-25

    Applicant: ASML NETHERLANDS BV

    Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  JONG DE FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  GOMPEL VAN EDWIN AUGUSTINUS MA

    Abstract: A lithographic apparatus includes a substrate support (2) that is constructed to support a substrate (6), and a projection system (4) that is configured to project a patterned radiation beam (5) onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory (7) of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration (1) for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

Patent Agency Ranking