公开(公告)号：JP2008042201A

公开(公告)日：2008-02-21

申请号：JP2007200649

申请日：2007-08-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DUIJNHOVEN MARTINUS ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/709 ,  G03F7/70691 ,  G03F7/70833

Abstract: PROBLEM TO BE SOLVED: To provide cable connection between a first object and a second object, in which vibration propagated or transmitted from the first object to the second object is reduced. SOLUTION: The cable connection between the first object and the second object includes a cable bundle containing one or more cables, one end of which is fixed to the first object and the other end of which is fixed to the second object; a cable bundle holder configured so as to hold the cable bundle at a position along the length of the cable bundle;a control system configured so as to control a position of the cable bundle holder with respect to the second object. A control system for the cable connection, and a method for reducing vibration transmitted via the cable connection from the first object to the second object. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供第一物体和第二物体之间的电缆连接，其中从第一物体传播或传播的振动减少到第二物体。 解决方案：第一物体和第二物体之间的电缆连接包括一束包含一根或多根电缆的电缆束，其一端固定在第一物体上，另一端固定在第二物体上; 电缆束保持器，其构造成将电缆束保持在沿着电缆束的长度的位置;控制系统，被配置为控制电缆束保持器相对于第二物体的位置。 一种用于电缆连接的控制系统，以及一种减少通过电缆连接从第一物体传递到第二物体的振动的方法。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2009152597A

公开(公告)日：2009-07-09

申请号：JP2008318049

申请日：2008-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  HEMPENIUS PETER PAUL ,  DE VOS YOUSSEF KAREL MARIA ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  ROOZEN NICOLAAS BERNARDUS ,  VAN DEN BOOGAERT ERWIN ANTONIU ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

IPC: H01L21/027 ,  F16F15/02

CPC classification number: G10K11/178 ,  G03B27/42 ,  G03F7/709 ,  G10K2210/129

Abstract: PROBLEM TO BE SOLVED: To reduce an influence of vibrations in a lithographic apparatus.
SOLUTION: A lithographic apparatus transfers a pattern from a patterning device onto a substrate. This lithographic apparatus includes an acoustic sensor which measures first acoustic vibrations in a sensor measurement region of the lithographic apparatus. An actuator is provided at least in a region within the lithographic apparatus in order to generate second acoustic vibrations. Furthermore, a control device is provided which has a sensor input part for receiving a sensor signal of the acoustic sensor and an actuator output part for giving an actuator driving signal to the actuator. The control device drives the actuator so that the second acoustic vibrations cancel the first acoustic vibrations at least partially in the region.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：减少光刻设备中振动的影响。 解决方案：光刻设备将图案从图案形成装置传送到基板上。 该光刻设备包括测量光刻设备的传感器测量区域中的第一声振动的声传感器。 致动器至少设置在光刻设备内的区域中，以产生第二声振动。 此外，提供了一种控制装置，其具有用于接收声传感器的传感器信号的传感器输入部分和用于向致动器提供致动器驱动信号的致动器输出部分。 控制装置驱动致动器，使得第二声振动至少部分地在该区域中抵消第一声振动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009130354A

公开(公告)日：2009-06-11

申请号：JP2008290446

申请日：2008-11-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

IPC: H01L21/027 ,  F16F15/02 ,  G03F7/20

CPC classification number: G03F7/709 ,  F16F15/002

Abstract: PROBLEM TO BE SOLVED: To provide a combination of a structure of which attenuation performance in an active attenuation system is improved, and the active attenuation system. SOLUTION: The active attenuation system for attenuating vibration in at least one portion of the structure includes: a device for obtaining the amount of position of the structure; and an actuator for applying force to the structure depending on an obtained amount of position. In this case, the device calculates the amount of position of the structure based on an actuator signal. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供改善有源衰减系统中的衰减性能的结构和主动衰减系统的组合。 解决方案：用于衰减结构的至少一部分中的振动的主动衰减系统包括：用于获得结构的位置量的装置; 以及用于根据获得的位置量向结构施加力的致动器。 在这种情况下，设备基于致动器信号来计算结构的位置量。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009105398A

公开(公告)日：2009-05-14

申请号：JP2008266921

申请日：2008-10-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/709 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved in the accuracy and/or the throughput of imaging. SOLUTION: This lithographic apparatus includes a projection system to project a patterned radiation beam to a substrate, and a damping system to damp the vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping sub-system to damp the vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping sub-system connected to the interface damping mass, the active damping sub-system including a sensor to measure a positional quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供改进成像精度和/或生产能力的光刻设备。 解决方案：该光刻设备包括将图案化的辐射束投射到基板的投影系统，以及阻尼系统，以阻尼至少部分投影系统的振动，阻尼系统包括界面阻尼块和活动 阻尼子系统阻尼至少部分界面阻尼块的振动，连接到投影系统的界面阻尼块和连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括 传感器，用于测量接口阻尼质量的位置数量和致动器，以基于由传感器提供的信号对接口阻尼质量施加力。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009130355A

公开(公告)日：2009-06-11

申请号：JP2008290448

申请日：2008-11-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

IPC: H01L21/027

CPC classification number: G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide an improved lithographic apparatus, where vibration in a projection system or another module of the equipment caused by displacement is reduced.
SOLUTION: The lithographic apparatus includes: an illumination system for attaching conditions to radial beams; a support for supporting a patterning device capable of giving a pattern to a section of the radial beams to form the patterning radial beams; a substrate table for holding a substrate; and the projection system for projecting the patterning radial beams onto a target portion of the substrate. The apparatus also includes: a sensor arranged to detect the vibration of the projection system in use; an actuator arranged to exert a force to the projection system in use; and the projection system for converting an output signal of the sensor to an actuator input signal in use so that vibration of the projection system is reduced by controlling the actuator by an input signal arranged to exert the force to the projection system during operation.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种改进的光刻设备，其中减少了由位移引起的设备的投影系统或其他模块中的振动。 解决方案：光刻设备包括：用于将条件附接到径向光束的照明系统; 用于支撑图案形成装置的支撑件，其能够向所述径向梁的一部分提供图案以形成所述图案化径向梁; 用于保持衬底的衬底台; 以及用于将图案化的径向光束投影到基板的目标部分上的投影系统。 该装置还包括：传感器，布置成检测投影系统在使用中的振动; 致动器，布置成在使用中向所述投影系统施加力; 以及用于将传感器的输出信号转换为使用中的致动器输入信号的投影系统，以便通过在操作期间通过布置成向投影系统施加力的输入信号控制致动器来减小投影系统的振动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009127861A

公开(公告)日：2009-06-11

申请号：JP2008290443

申请日：2008-11-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

IPC: F16F15/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/709 ,  F16F7/1005 ,  F16F15/02

Abstract: PROBLEM TO BE SOLVED: To provide a combination of a structure and two or more active damping systems capable of improving overall damping performance of a combination of the plurality of active damping systems. SOLUTION: This combination of a structure and two or more damping system is an active damping system assembly damping vibration of at least a part of the structure, and includes a sensor measuring a positional amount of interface mass attached to the structure, and a plurality of active dampers each including an actuator applying force to the interface mass depending on a signal supplied by the sensor. Each of the plurality of active damping systems is connected to the interface mass. This structure can be formed into a projection system of a lithography device. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供能够改善多个主动阻尼系统的组合的总体阻尼性能的结构和两个或更多个主动阻尼系统的组合。 解决方案：结构和两个或更多个阻尼系统的组合是主动阻尼系统组件阻尼结构的至少一部分的振动，并且包括测量附接到结构的界面质量的位置量的传感器，以及 多个有源阻尼器，每个有源阻尼器包括致动器根据传感器提供的信号向接口质量施力。 多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以形成为光刻设备的投影系统。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009299896A

公开(公告)日：2009-12-24

申请号：JP2009163911

申请日：2009-07-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  AUER FRANK ,  DUIJNHOVEN MARTINUS V ,  GERTRUDIS MEIJERS PIETER J ,  VAN DER TOORN JAN-GERARD C ,  DE PEE JOOST

IPC: F16F15/04 ,  F16F15/02 ,  H01L21/027

CPC classification number: G03F7/709 ,  F16F9/003 ,  F16F9/3235 ,  F16F15/0232 ,  F16F15/0275 ,  G03F7/70833

Abstract: PROBLEM TO BE SOLVED: To provide a support device and a lithographic apparatus small in rigidity.
SOLUTION: An air mount 20 includes gas 8 between a gas chamber wall 10 and a movable member 12, and thus, provides a supporting force between a target 4 and a floor 6. In the air mount 20, a flexible film 22 is formed on the gas chamber wall 10. When pressure in a gas chamber is increased, the flexible film 22 is moved outwardly. Thus, the volume of the gas chamber is increased so as to at least partially compensate an increase in the pressure. When the pressure in the gas chamber is reduced, the flexible film 22 is moved inwardly. Thus, the volume of the gas chamber is reduced so as to at least partially compensate a decrease in the pressure. Therefore, the flexible film 22 effectively alleviates an effect of vibration on the gas chamber wall 10, and the rigidity of the air mount 20 is effectively reduced.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供刚性小的支撑装置和光刻设备。 解决方案：空气支架20包括在气体室壁10和可动构件12之间的气体8，从而在目标4和地板6之间提供支撑力。在空气支架20中，柔性膜22 形成在气室壁10上。当气室中的压力增加时，柔性膜22向外移动。 因此，增加了气室的体积，以便至少部分地补偿压力的增加。 当气室中的压力减小时，柔​​性膜22向内移动。 因此，气室的体积减小，以便至少部分地补偿压力的降低。 因此，柔性膜22有效地减轻了对气室壁10的振动的影响，并且有效地降低了空气支架20的刚度。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009141349A

公开(公告)日：2009-06-25

申请号：JP2008303286

申请日：2008-11-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/709

Abstract: PROBLEM TO BE SOLVED: To reduce a possible impact of acoustic vibration to a part of a lithographic apparatus, and to thereby enhance the precision of the lithographic apparatus, overlay, or all other parameters. SOLUTION: A lithographic apparatus may be provided with an acoustic resonator to attenuate acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The Helmholtz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress the transfer of acoustical vibration caused by e.g. the movement of the patterning device stage to the projection system. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：减少声波振动对光刻设备的一部分的可能影响，从而提高光刻设备，覆盖层或所有其他参数的精度。 解决方案：光刻设备可以设置有声谐振器以衰减光刻设备中的声振动。 声谐振器可以包括亥姆霍兹共振器。 亥姆霍兹共振器可以设置有有源元件，以提供由谐振器形成的质量弹簧组件的主动阻尼和/或改变弹簧特性。 谐振器可以设置在图案形成装置台和投影系统之间的屏蔽中的狭缝处，以抑制由例如导电层引起的声振动的传递。 图案形成装置台到投影系统的移动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006191019A

公开(公告)日：2006-07-20

申请号：JP2005357356

申请日：2005-12-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS ,  AUER FRANK ,  DUIJNHOVEN MARTINUS V ,  GERTRUDIS MEIJERS PIETER J ,  VAN DER TOORN JAN-GERARD C ,  DE PEE JOOST

IPC: H01L21/027 ,  F16F9/02 ,  F16F9/04 ,  F16F15/02 ,  G03F7/20 ,  H01L21/677

CPC classification number: G03F7/709 ,  F16F9/003 ,  F16F9/3235 ,  F16F15/0232 ,  F16F15/0275 ,  G03F7/70833

Abstract: PROBLEM TO BE SOLVED: To provide a vibration isolation device with a small rigidity and a lithography equipment. SOLUTION: To adequately transport a pattern to a substrate or any other pattern with a micro structure, the vibration isolation device like an air mount is used to minimize vibration from an external support structure like a floor. To improve the vibration isolation property of the air mount, a pressure controller is provided that can reduce pressure gas pressure variation within a gas chamber, resulting in decrease in air mount (positive) rigidity. The volume of the above gas chamber changes due to vibration. In addition, the corresponding pressure variation is decreased through the use of a rigidity reduction device and a force applied to the supported object itself is additionally reduced, so that the air mount rigidity can be reduced. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有小刚度的隔振装置和光刻设备。 解决方案：为了将图案充分地传送到基板或具有微结构的任何其它图案，使用诸如空气支架的隔振装置来最小化来自诸如地板的外部支撑结构的振动。 为了提高空气安装座的隔振性能，提供了能够减小气室内的压力气体压力变化的压力控制器，导致空气安装（正）刚度的降低。 上述气室的体积由于振动而变化。 此外，通过使用刚性减小装置来减小相应的压力变化，并且额外减小施加到被支撑物体的力的力，从而可以降低空气安装刚度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG152185A1

公开(公告)日：2009-05-29

申请号：SG2008078487

申请日：2008-10-21

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF ,  VAN DER WIJST MARC WILHELMUS MARIA ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS ,  BOSCHKER STIJN

Abstract: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.