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    Combination of structure and two or more active damping systems, lithography device, and projection assembly
    1.
    发明专利
    Combination of structure and two or more active damping systems, lithography device, and projection assembly 有权
    结构和两个或更多主动阻尼系统的组合，平面设备和投影组件

    公开(公告)号：JP2009127861A

    公开(公告)日：2009-06-11

    申请号：JP2008290443

    申请日：2008-11-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

    IPC: F16F15/02 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/709 ,  F16F7/1005 ,  F16F15/02

    Abstract: PROBLEM TO BE SOLVED: To provide a combination of a structure and two or more active damping systems capable of improving overall damping performance of a combination of the plurality of active damping systems. SOLUTION: This combination of a structure and two or more damping system is an active damping system assembly damping vibration of at least a part of the structure, and includes a sensor measuring a positional amount of interface mass attached to the structure, and a plurality of active dampers each including an actuator applying force to the interface mass depending on a signal supplied by the sensor. Each of the plurality of active damping systems is connected to the interface mass. This structure can be formed into a projection system of a lithography device. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够改善多个主动阻尼系统的组合的总体阻尼性能的结构和两个或更多个主动阻尼系统的组合。 解决方案：结构和两个或更多个阻尼系统的组合是主动阻尼系统组件阻尼结构的至少一部分的振动，并且包括测量附接到结构的界面质量的位置量的传感器，以及 多个有源阻尼器，每个有源阻尼器包括致动器根据传感器提供的信号向接口质量施力。 多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以形成为光刻设备的投影系统。 版权所有（C）2009，JPO＆INPIT

    Combination of structure and active attenuation system, and lithography apparatus
    2.
    发明专利
    Combination of structure and active attenuation system, and lithography apparatus 有权
    结构和主动衰减系统的组合，以及平面设备

    公开(公告)号：JP2009130354A

    公开(公告)日：2009-06-11

    申请号：JP2008290446

    申请日：2008-11-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

    IPC: H01L21/027 ,  F16F15/02 ,  G03F7/20

    CPC classification number: G03F7/709 ,  F16F15/002

    Abstract: PROBLEM TO BE SOLVED: To provide a combination of a structure of which attenuation performance in an active attenuation system is improved, and the active attenuation system. SOLUTION: The active attenuation system for attenuating vibration in at least one portion of the structure includes: a device for obtaining the amount of position of the structure; and an actuator for applying force to the structure depending on an obtained amount of position. In this case, the device calculates the amount of position of the structure based on an actuator signal. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供改善有源衰减系统中的衰减性能的结构和主动衰减系统的组合。 解决方案：用于衰减结构的至少一部分中的振动的主动衰减系统包括：用于获得结构的位置量的装置; 以及用于根据获得的位置量向结构施加力的致动器。 在这种情况下，设备基于致动器信号来计算结构的位置量。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus having active damping subassembly
    3.
    发明专利
    Lithographic apparatus having active damping subassembly 有权
    具有主动阻尼分层的平面设备

    公开(公告)号：JP2009105398A

    公开(公告)日：2009-05-14

    申请号：JP2008266921

    申请日：2008-10-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70883

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved in the accuracy and/or the throughput of imaging. SOLUTION: This lithographic apparatus includes a projection system to project a patterned radiation beam to a substrate, and a damping system to damp the vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping sub-system to damp the vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping sub-system connected to the interface damping mass, the active damping sub-system including a sensor to measure a positional quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供改进成像精度和/或生产能力的光刻设备。 解决方案：该光刻设备包括将图案化的辐射束投射到基板的投影系统，以及阻尼系统，以阻尼至少部分投影系统的振动，阻尼系统包括界面阻尼块和活动 阻尼子系统阻尼至少部分界面阻尼块的振动，连接到投影系统的界面阻尼块和连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括 传感器，用于测量接口阻尼质量的位置数量和致动器，以基于由传感器提供的信号对接口阻尼质量施加力。 版权所有（C）2009，JPO＆INPIT

    LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY
    4.
    发明专利
    LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY 未知

    公开(公告)号：SG152185A1

    公开(公告)日：2009-05-29

    申请号：SG2008078487

    申请日：2008-10-21

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF ,  VAN DER WIJST MARC WILHELMUS MARIA ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS ,  BOSCHKER STIJN

    Abstract: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

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