公开(公告)号：NL2005208A

公开(公告)日：2011-03-29

申请号：NL2005208

申请日：2010-08-11

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  KATE NICOLAAS ,  OTTENS JOOST ,  DONK GERRIT ,  ES JOHANNES ,  PATEL HRISHIKESH

IPC: G03F7/20

公开(公告)号：NL2005207A

公开(公告)日：2011-03-29

申请号：NL2005207

申请日：2010-08-11

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  KATE NICOLAAS ,  OTTENS JOOST ,  DONK GERRIT ,  ES JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.