公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2012256887A

公开(公告)日：2012-12-27

申请号：JP2012127570

申请日：2012-06-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MAIKEL ADRIANUS CORNELIS SCHEPERS ,  JULINGS MARCUS FRANCISCUS ANTONIUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERNARD JACOB ANDRIES STOMMEN ,  HERMANUS JOHANNES MARIA KREUWEL ,  JACOB COHEN ,  PATEL HRISHIKESH ,  JANSEN PEPIN WINAND JOSEPH ,  BORN MARLTEN KEITH YANG

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70575 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/02 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: PROBLEM TO BE SOLVED: To provide a radiation source coping with infrared radiation.SOLUTION: A radiation source has a collector comprising a fuel source constituted to supply fuel to a plasma emission position to evaporate the fuel and form a plasma, constituted to collect EUV radiation emitted by the plasma and guide it toward an intermediate focus, and comprising a diffraction grating constituted to diffract infrared radiation emitted by the plasma. The radiation source is also a radiation conduit arranged in front of the intermediate focus, and the radiation conduit comprises an inlet aperture connected to an outlet aperture by a main body tapered inward. The radiation conduit comprises an inner portion and an outer portion. The inner portion is nearer to the intermediate focus than the outer portion, and the inner portion is constituted to reflect incident diffraction infrared radiation toward the outer portion.

Abstract translation: 要解决的问题：提供应对红外辐射的辐射源。 解决方案：辐射源具有包括燃料源的收集器，燃料源被构造成将燃料供应到等离子体发射位置以蒸发燃料并形成等离子体，其被构造成收集由等离子体发射的EUV辐射并将其引导到中间焦点， 并且包括构成为衍射由等离子​​体发射的红外辐射的衍射光栅。 辐射源也是布置在中间聚焦前面的辐射导管，并且辐射导管包括通过主体向内锥形连接到出口孔的入口孔。 辐射导管包括内部部分和外部部分。 内部部分比外侧部分更靠近中间焦点，并且内部部分构成为朝向外部反射入射的衍射红外辐射。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011069608A

公开(公告)日：2011-04-07

申请号：JP2010210310

申请日：2010-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  PATEL HRISHIKESH ,  VAN DONK GERRIT ,  VEN ES JOHANNES

IPC: F28D15/02 ,  H01L21/027

CPC classification number: F28D15/04 ,  G03F7/70341 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing the non-uniform cooling of an object such that the object is maintained at a substantially uniform temperature.
SOLUTION: The heat pipe maintains the object at a substantially uniform temperature. The heat pipe includes a liquid reservoir and a vapor space, a chamber with one part defined by a condensation face, and a liquid transport device applying force adding to gravity to a liquid and transporting the liquid from the condensation face to the reservoir. The condensation face is formed such that a condensation liquid is moved toward the liquid transport device along the condensation face.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少物体的不均匀冷却的系统，使得物体保持在基本均匀的温度。

解决方案：热管将物体保持在基本均匀的温度。 热管包括液体储存器和蒸汽空间，具有由冷凝面限定的一部分的腔室以及将重力加到液体并将液体从冷凝面传送到储液器的液体输送装置。 冷凝面形成为使得冷凝液沿着冷凝面向液体输送装置移动。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011151397A

公开(公告)日：2011-08-04

申请号：JP2011009381

申请日：2011-01-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  LAURENT THIBAULT SIMON MATHIEU ,  MIRANDA MARCIO ALEXANDRE CANO ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES ,  FENG PENG ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic process where a process error caused by one or more heat sources can be reduced or minimized. SOLUTION: An immersion lithographic apparatus is provided. The immersion lithographic apparatus has a substrate table including a drain so configured as to receive an immersion liquid leaking into a gap between the edge of a substrate on the substrate table and the edge of a concave portion where the substrate is disposed. By directing one or more jets of the liquid toward the back side of a portion that supports the substrate, at least a portion of the concave portion that supports the substrate is thermally adjusted, thus providing a thermal adjustment system in the immersion lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少或最小化由一个或多个热源引起的过程误差的光刻工艺。 解决方案：提供浸没式光刻设备。 浸没式光刻设备具有衬底台，该衬底台包括漏液，其被构造成接收浸没液体泄漏到衬底台上的衬底的边缘与设置衬底的凹部的边缘之间的间隙中。 通过将液体的一个或多个射流引导到支撑衬底的部分的后侧，至少支撑衬底的凹部的一部分被热调节，从而在浸没式光刻设备中提供热调节系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011014905A

公开(公告)日：2011-01-20

申请号：JP2010143336

申请日：2010-06-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  BENSCHOP JOZEF PETRUS HENRICUS ,  KATE NICOLAAS TEN ,  ROSET NIEK JACOBUS JOHANNES ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  ZDRAVKOV ALEXANDER NIKOLOV ,  PATEL HRISHIKESH ,  VAN OPSTAL SANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a system which improves stability of a meniscus or reduces incompleteness of the meniscus, where the system is, for example, to reduce a possibility of generating a bubble or releasing a drop.SOLUTION: A cover for a substrate table in an immersion lithographic apparatus is provided to cover at least a gap between a substrate and a recess in the substrate table for receiving the substrate.

Abstract translation: 要解决的问题：提供一种系统，其提高弯液面的稳定性或减少弯液面的不完整性，其中系统例如降低产生气泡或释放液滴的可能性。解决方案：用于基板的盖 浸没式光刻设备中的工作台被设置成覆盖衬底和用于接收衬底的衬底台中的凹部之间的至少间隙。

公开(公告)号：NL2005874A

公开(公告)日：2011-07-25

申请号：NL2005874

申请日：2010-12-17

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES ,  KUSTERS GERARDUS ,  LAURENT THIBAULT ,  MIRANDA MARCIO ,  BLOKS RUUD ,  FENG PENG ,  KUNNEN JOHAN

IPC: G03F7/20

公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：NL2004807A

公开(公告)日：2011-01-04

申请号：NL2004807

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  BENSCHOP JOZEF ,  KATE NICOLAAS ,  ROSET NIEK ,  KUSTERS GERARDUS ,  ZDRAVKOV ALEXANDER ,  PATEL HRISHIKESH ,  OPSTAL SANDER

IPC: G03F7/20

公开(公告)号：CA3066546A1

公开(公告)日：2018-12-20

申请号：CA3066546

申请日：2018-06-08

Applicant: ASML NETHERLANDS BV

Inventor： VLES DAVID FERDINAND ,  ANDE CHAITANYA KRISHNA ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  JANSSEN JOHANNES JOSEPH ,  JANSSEN PAUL ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  MEIJER MARCEL PETER ,  MEIJERINK WOUTER ROGIER ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  OLSMAN RAYMOND ,  PATEL HRISHIKESH ,  PETER MARIA ,  VAN DEN BOSCH GERRIT ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VOORTHUIJZEN WILLEM-PIETER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEXANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：NL2005208A

公开(公告)日：2011-03-29

申请号：NL2005208

申请日：2010-08-11

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  KATE NICOLAAS ,  OTTENS JOOST ,  DONK GERRIT ,  ES JOHANNES ,  PATEL HRISHIKESH

IPC: G03F7/20