公开(公告)号：NL2010642A

公开(公告)日：2013-11-20

申请号：NL2010642

申请日：2013-04-16

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  WESTERLAKEN JAN

IPC: G03F7/20

公开(公告)号：NL2004907A

公开(公告)日：2010-12-20

申请号：NL2004907

申请日：2010-06-17

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  JANSEN HANS ,  BRUIJSTENS JEROEN ,  THOMAS IVO ,  KUSTERS GERARDUS ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：NL2006506A

公开(公告)日：2011-10-31

申请号：NL2006506

申请日：2011-03-31

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  JACOBS JOHANNES ,  RIEPEN MICHEL ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：NL2005874A

公开(公告)日：2011-07-25

申请号：NL2005874

申请日：2010-12-17

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES ,  KUSTERS GERARDUS ,  LAURENT THIBAULT ,  MIRANDA MARCIO ,  BLOKS RUUD ,  FENG PENG ,  KUNNEN JOHAN

IPC: G03F7/20

公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：NL2002964A1

公开(公告)日：2009-12-17

申请号：NL2002964

申请日：2009-06-04

Applicant: ASML NETHERLANDS BV

Inventor： LEXMOND AXEL ,  DONDERS SJOERD ,  JACOBS JOHANNES ,  GEERS LEONARD

IPC: G03F7/20 ,  H01L21/66

公开(公告)号：NL2010762A

公开(公告)日：2013-12-02

申请号：NL2010762

申请日：2013-05-07

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  BLOKS RUUD ,  CORTIE ROGIER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES ,  LAFARRE RAYMOND ,  LEMPENS HAN ,  OVERKAMP JIM ,  PIETERSE GERBEN ,  POLET THEODORUS ,  SIMONS WILHELMUS ,  STEFFENS KOEN ,  TROMP SIEGFRIED ,  VY VAN VUONG

IPC: G03F7/20 ,  H01L21/683

公开(公告)号：NL2006180A

公开(公告)日：2011-09-13

申请号：NL2006180

申请日：2011-02-11

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  JACOBS JOHANNES ,  YOUSEFI MIRVAIS ,  ENGELMANN MICHAEL ,  HARMSMA PETER

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

公开(公告)号：NL2005208A

公开(公告)日：2011-03-29

申请号：NL2005208

申请日：2010-08-11

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  KATE NICOLAAS ,  OTTENS JOOST ,  DONK GERRIT ,  ES JOHANNES ,  PATEL HRISHIKESH

IPC: G03F7/20

公开(公告)号：NL2005207A

公开(公告)日：2011-03-29

申请号：NL2005207

申请日：2010-08-11

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  KATE NICOLAAS ,  OTTENS JOOST ,  DONK GERRIT ,  ES JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.