公开(公告)号：KR20180017188A

公开(公告)日：2018-02-20

申请号：KR20187001374

申请日：2016-06-10

Applicant: ASML NETHERLANDS BV

Inventor： DEN BOEF ARIE JEFFREY ,  DAVIS TIMOTHY DUGAN ,  ENGBLOM PETER DAVID ,  BHATTACHARYYA KAUSTUVE

IPC: G03F7/20 ,  G01B11/27 ,  G03F9/00

CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F7/70633

Abstract: 복수개의기판측정레시피중 하나의기판측정레시피와상기복수개의기판측정레시피중 나머지기판측정레시피들각각사이의레시피일치도를결정하는단계; 상기레시피일치도의함수를계산하는단계; 상기함수가기준을만족시키면상기복수개의기판측정레시피중에서상기하나의기판측정레시피를제거하는단계; 및종결조건이만족될때까지상기결정하는단계, 계산하는단계및 제거하는단계를반복하는단계를포함하는, 방법이개시된다. 또한, 복수개의기판측정레시피를저장하도록구성되는저장소, 및복수개의기판측정레시피사이의레시피일치도에기초하여복수개의기판측정레시피중에서하나이상의기판측정레시피를선택하도록구성되는프로세서를포함하는, 기판측정장치가개시된다.

Abstract translation: 确定多个基板测量配方的基板测量配方与多个基板测量配方中的每个剩余基板测量配方之间的配方匹配程度; 计算食谱匹配度的函数; 如果功能满足标准，则从多个基板测量配方中移除一个基板测量配方; 并重复确定，计算和删除，直到满足终止条件。 以及处理器，其被配置为基于所述多个基板测量配方之间的配方一致性来从多个基板测量配方中选择一个或多个基板测量配方，其中所述处理器被配置为存储多个基板测量配方， 该装置启动。

公开(公告)号：NL2013838A

公开(公告)日：2015-06-18

申请号：NL2013838

申请日：2014-11-20

Applicant: ASML NETHERLANDS BV

Inventor： DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  ENGBLOM PETER DAVID ,  KESSELS LAMBERTUS GERARDUS MARIA ,  BOEF ARIE JEFFREY ,  BHATTACHARYYA KAUSTUVE ,  HINNEN PAUL CHRISTIAAN ,  PIETERS MARCO JOHANNES ANNEMARIE

IPC: G01N21/00 ,  G03F7/20

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.