公开(公告)号：KR20180042402A

公开(公告)日：2018-04-25

申请号：KR20187008543

申请日：2016-08-22

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER SCHAAR MAURITS ,  ZHANG YOUPING ,  SMILDE HENDRIK JAN HIDDE ,  TSIATMAS ANAGNOSTIS ,  VAN LEEST ADRIAAN JOHAN ,  VERMA ALOK ,  THEEUWES THOMAS ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  HINNEN PAUL CHRISTIAAN

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95

CPC classification number: G03F7/70491 ,  G01N21/47 ,  G01N21/9501 ,  G03F7/70633 ,  G03F7/70683

Abstract: 기판은리소그래피프로세스에의해그 위에형성된제 1 및제 2 타겟구조체를포함한다. 각각의타겟구조체는제 1 및제 2 리소그래피단계를사용하여기판상의단일재료층내에형성되는 2-차원주기적구조체를포함하는데, 제 1 타겟구조체내에서, 제 2 리소그래피단계에서형성되는피쳐는제 1 리소그래피단계에서형성되는피쳐에대해서, 제 1 리소그래피단계에서형성되는피쳐의공간주기의절반에가까운제 1 바이어스양만큼변위되고, 제 2 타겟구조체내에서, 제 2 리소그래피단계에서형성되는피쳐는제 1 리소그래피단계에서형성되는피쳐에대해서, 상기공간주기의절반에가깝고제 1 바이어스양과상이한제 2 바이어스양만큼변위된다. 제 1 타겟구조체의각도-분해산란스펙트럼및 제 2 타겟구조체의각도-분해산란스펙트럼이획득되고, 리소그래피프로세스의파라미터의측정이제 1 및제 2 타겟구조체의산란스펙트럼들에서발견되는비대칭을사용하여, 측정으로부터유도된다.

公开(公告)号：JP2012094915A

公开(公告)日：2012-05-17

申请号：JP2012022300

申请日：2012-02-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRANCISCUS ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JUENINK ANDRE BERNARDUS ,  MEGENS HENRY ,  NAVARRO Y KOREN RAMON ,  TOLSMA HOITE PIETER THEODOOR ,  HUBERTUS JOHANNES GERTRUDUS SIMONS ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  LEE BRIAN ,  DUNBAR ALLAN

IPC: G01B11/00 ,  H01L21/027 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting apparatus in which accuracy of positioning and/or robust properties is improved.SOLUTION: An alignment system for a lithographic apparatus comprises: a positioning radiation source 1; a detection system having a first detector channel and a second detector channel; and a position determining unit that communicates with the detection system. The position determining unit processes information from the first and second detector channels in combination, and determines a position of a positioning mark on a first object relative to a reference position on a second object, based on the combined information.

Abstract translation: 要解决的问题：提供一种提高定位精度和/或鲁棒特性的光刻投影装置的对准系统。 解决方案：用于光刻设备的对准系统包括：定位辐射源1; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的定位标记的位置。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2008211247A

公开(公告)日：2008-09-11

申请号：JP2008119913

申请日：2008-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN HAREN RICHARD JOHANNES FRA ,  HINNEN PAUL CHRISTIAAN ,  LALBAHADOERSING SANJAY ,  MEGENS HENRY ,  VAN DER SCHAAR MAURITS

IPC: G01B11/00 ,  H01L21/027 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide a marker structure on a substrate for optical alignment of the substrate including a plurality of first structural elements and a plurality of second structural elements. SOLUTION: For use, the marker structure enables optical alignment by providing at least one light beam directed on the marker structure, detecting light received from the marker structure via a sensor, and obtaining alignment information from the detected light, the alignment information including information relating a substrate position to the sensor. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了在包括多个第一结构元件和多个第二结构元件的基板的光学对准的基板上提供标记结构。 解决方案：为了使用，标记结构通过提供指向标记结构的至少一个光束来实现光学对准，通过传感器检测从标记结构接收的光，以及从检测到的光获得对准信息，对准信息 包括将衬底位置与传感器相关的信息。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007214560A

公开(公告)日：2007-08-23

申请号：JP2007009156

申请日：2007-01-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN HAREN RICHARD JOHANNES FRA ,  HINNEN PAUL CHRISTIAAN ,  LALBAHADOERSING SANJAY ,  MEGENS HENRY ,  VAN DER SCHAAR MAURITS

IPC: G01B11/00 ,  H01L21/027 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide a marker structure that allows correction of a phase depth in such a way that negative interference within a diffraction pattern is prevented, a lithographic projection device provided with such a marker structure for lithography, and a method of aligning a substrate using such a marker structure for lithography. SOLUTION: The marker structure is characterized in that: a first structural element has a first reflecting surface on a first level; a second structural element is substantially non-reflecting; a second reflecting surface is disposed on a second level lower than the first level, wherein a separation between the first and second reflecting surfaces determines a phase depth condition for the detected light; and recesses R1, R2, R3 are provided in the second reflecting surface; thereby modifying the phase depth condition. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种标记结构，其允许校正相位深度，使得防止衍射图案中的负干涉，设置有这种用于光刻的标记结构的光刻投影装置和方法 使用这种用于光刻的标记结构来对准衬底。 标记结构的特征在于：第一结构元件在第一层上具有第一反射表面; 第二结构元件基本上不反射; 第二反射表面设置在比第一水平低的第二水平面上，其中第一和第二反射表面之间的间隔确定检测到的光的相位深度状态; 并且凹部R1，R2，R3设置在第二反射面上; 从而修改相位深度条件。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2009069163A

公开(公告)日：2009-04-02

申请号：JP2008307147

申请日：2008-12-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN BILSEN FRANCISCUS BERNARDU ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRA ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JUENINK ANDRE BERNARDUS ,  MEGENS HENRY ,  NAVARRO Y KOREN RAMON ,  TOLSMA HOITE PIETER THEODOOR ,  HUBERTUS JOHANNES GERTRUDUS SI ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  LEE BRIAN ,  DUNBAR ALLAN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting device, with the accuracy of positioning and/or robust properties improved. SOLUTION: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit that communicates with the detection system. The position-determining unit processes information from the first and second detector channels in combination and determines the position of an alignment mark on a first object relative to a reference position on a second object, based on the combined information. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供用于光刻投影装置的对准系统，其具有改善的定位精度和/或鲁棒特性。 解决方案：用于光刻设备的对准系统具有对准辐射源，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统通信的位置确定单元。 位置确定单元组合地处理来自第一和第二检测器通道的信息，并且基于组合的信息确定相对于第二对象上的参考位置的第一对象上的对准标记的位置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008034878A

公开(公告)日：2008-02-14

申请号：JP2007267899

申请日：2007-10-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN BILSEN FRANCISCUS BERNARDU ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRA ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JUENINK ANDRE BERNARDUS ,  MEGENS HENRY ,  NAVARRO Y KOREN RAMON ,  TOLSMA HOITE PIETER THEODOOR ,  HUBERTUS JOHANNES GERTRUDUS SI ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  LEE BRIAN ,  DUNBAR ALLAN

IPC: G01B11/00 ,  H01L21/027 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide an alignment system for lithographic projection equipment in which the accuracy and/or robust property of alignment are improved. SOLUTION: The alignment system of the lithographic equipment includes an aligning radiation source 1, a detection system having a first detector channel and a second detector channel, and an alignment unit communicated with the detection system. The alignment unit determines the position of an alignment mark on a first object for a reference position on a second object based on a combined information that is combined and processed the information from the first and second detection channels. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于光刻投影设备的对准系统，其中对准的精度和/或鲁棒性能得到改善。 解决方案：光刻设备的对准系统包括对准辐射源1，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统连通的对准单元。 对准单元基于组合和处理来自第一和第二检测通道的信息的组合信息，确定第一对象上的对准标记在第二对象上的参考位置的位置。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004282019A

公开(公告)日：2004-10-07

申请号：JP2003366659

申请日：2003-09-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN HAREN RICHARD JOHANNES FRA ,  HINNEN PAUL CHRISTIAAN ,  LALBAHADOERSING SANJAY ,  MEGENS HENRY ,  VAN DER SCHAAR MAURITS

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide a marker structure on a substrate for optical alignment of the substrate, wherein the marker structure comprises a plurality of first structural elements and a plurality of second structural elements. SOLUTION: In using the marker structure, the optical alignment is performed by; providing at least one light beam directed to the marker structure; detecting the light received from the marker structure by a sensor; and determining alignment information from the detected light, wherein the alignment information includes information relating a position of the substrate to the sensor. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004282017A

公开(公告)日：2004-10-07

申请号：JP2003366657

申请日：2003-09-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN BILSEN FRANCISCUS BERNARDU ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRA ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JUENINK ANDRE BERNARDUS ,  MEGENS HENRY ,  NAVARRO Y KOREN RAMON ,  TOLSMA HOITE PIETER THEODOOR ,  HUBERTUS JOHANNES GERTRUDUS SI ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  LEE BRIAN ,  DUNBAR ALLAN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00

CPC classification number: G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide a positioning system for a lithographic projector in which accuracy of alignment and/or hardness is improved. SOLUTION: The positioning system for a lithographic apparatus has a positioning radiation source 1, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination, to determine a position of a positioning mark on a first object relative to a reference position on a second object based on the combined information. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：NL2013838A

公开(公告)日：2015-06-18

申请号：NL2013838

申请日：2014-11-20

Applicant: ASML NETHERLANDS BV

Inventor： DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  ENGBLOM PETER DAVID ,  KESSELS LAMBERTUS GERARDUS MARIA ,  BOEF ARIE JEFFREY ,  BHATTACHARYYA KAUSTUVE ,  HINNEN PAUL CHRISTIAAN ,  PIETERS MARCO JOHANNES ANNEMARIE

IPC: G01N21/00 ,  G03F7/20

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

公开(公告)号：SG152898A1

公开(公告)日：2009-06-29

申请号：SG2003056066

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRANCISCUS ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JEUNINK ANDRE BERNARDUS ,  MEGENS HENRY ,  KOREN NAVARRO Y ,  TOLSMA HOITE PIETER THEODOOR ,  SIMONS HUBERTUS JOHANNES GERTRUDUS ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  BOK LEE YOUNG ,  DUNBAR ALLAN REUBEN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01D5/26 ,  G03F7/207

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.