公开(公告)号：JP2010045381A

公开(公告)日：2010-02-25

申请号：JP2009224795

申请日：2009-09-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MARIA ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILLHELMUS JOSEPHUS MARIA ,  KAMEN HRISTOV CHILOV

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that utilize efficient patterning means. SOLUTION: The present invention includes a lithographic apparatus and a device manufacturing method that uses a patterning apparatus that increases the number of individually controllable elements to be simultaneously programmed, in order to increase the update speed of an array of the individually controllable elements. Thus, the number of high-speed analog inputs required for the array is decreased, the complexity of the array is reduced, and the maximum update speed of the array is increased. Furthermore, the number of elements in the array can be increased easily. The patterning apparatus is divided into a plurality of cell groups, and the lithographic apparatus may include a plurality of supply channels. Each supply channel is disposed such that it supplies a voltage signal to each cell that corresponds to the cell group. Thus, the required number of inputs to the patterning apparatus for individually addressing each cell is reduced. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种利用有效的图案形成装置的系统和方法。 解决方案：本发明包括使用增加可同时编程的独立可控元件的数量的图案形成装置的光刻设备和设备制造方法，以便增加独立可控元件阵列的更新速度 。 因此，阵列所需的高速模拟输入的数量减少，阵列的复杂度降低，阵列的最大更新速度增加。 此外，阵列中的元素的数量可以容易地增加。 图案形成装置被分成多个单元组，并且光刻设备可以包括多个供电通道。 每个供应通道被布置成使得其向与单元组对应的每个单元提供电压信号。 因此，减少了用于单独寻址每个单元的图案形成装置所需的输入数量。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：NL2013838A

公开(公告)日：2015-06-18

申请号：NL2013838

申请日：2014-11-20

Applicant: ASML NETHERLANDS BV

Inventor： DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  ENGBLOM PETER DAVID ,  KESSELS LAMBERTUS GERARDUS MARIA ,  BOEF ARIE JEFFREY ,  BHATTACHARYYA KAUSTUVE ,  HINNEN PAUL CHRISTIAAN ,  PIETERS MARCO JOHANNES ANNEMARIE

IPC: G01N21/00 ,  G03F7/20

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.