公开(公告)号：SG113566A1

公开(公告)日：2005-08-29

申请号：SG200500186

申请日：2005-01-13

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  FRANKEN JOHANNES CHRISTIAN LEO ,  MICKAN UWE ,  VOORMA HARM-JAN

IPC: G02B17/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus comprising an illumination system (IL) for providing a projection beam of radiation (PB), a support structure (MT) for supporting patterning means (MA), the patterning means (MA) serving to impart the projection beam (PB) with a pattern in its cross-section. The apparatus further comprises a substrate table (WT) for holding a substrate (W), a projection system (PL) for projecting the patterned beam onto a target portion of the substrate (W), and a collector (1; 101; 201) which is arranged for transmitting radiation (R), received from a first radiation source (SO), to the illumination system (IL). The apparatus comprises at least a heater (2; 102; 202) for heating the collector (1; 101; 201) when the collector receives substantially no radiation from the first radiation source (SO). The invention further provides a device manufacturing method as well as a device manufactured thereby.