中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

7 records (took 0.026 seconds)

    Method of cleaning lithographic apparatus module, cleaning structure for lithographic apparatus module, and lithographic apparatus equipped with cleaning structure
    1.
    发明专利
    Method of cleaning lithographic apparatus module, cleaning structure for lithographic apparatus module, and lithographic apparatus equipped with cleaning structure 有权
    清洗光刻装置的方法，光栅装置的清洁结构和装有清洁结构的光刻装置

    公开(公告)号：JP2007184577A

    公开(公告)日：2007-07-19

    申请号：JP2006338066

    申请日：2006-12-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： FRERIKS JOHANNES MARIA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR V ,  KLUNDER DERK JAN WILFRED ,  VAN HERPEN MAARTEN MARINUS JOH

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

    Abstract: PROBLEM TO BE SOLVED: To provide a cleaning structure for a lithographic apparatus module in a collector. SOLUTION: The cleaning structure includes a hydrogen radical source constituted to provide a gas including a hydrogen radical to at least a part of a module; and a pump constituted to carry out a pump exhaust of the gas from the module, so that a flow rate of the gas including the hydrogen radical provided through at least the part of the module may become at least 1 m/s. Moreover, the cleaning structure can be equipped with a gas shutter constituted to adjust a flow of the gas including the hydrogen radical to at least the part of the module, a buffer volume of at least 1 m 3 communicating with the module, and a pump constituted to provide a gas pressure between 0.001 mbar (0.1 Pa) to 1 mbar (100 Pa) to the buffer volume. The cleaning structure can further include a gas return system. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于集光器中的光刻设备模块的清洁结构。 解决方案：清洁结构包括氢自由基源，其构成为向模块的至少一部分提供包括氢基团的气体; 以及构成为从模块执行气体排出泵的泵，使得通过至少模块部分提供的包括氢基团的气体的流量可以变为至少1m / s。 此外，清洁结构可以配备有气门，其构成为将包括氢自由基的气体的流动调整到模块的至少一部分，缓冲体积至少为1m 3 / 以及构造成提供在0.001毫巴（0.1Pa）至1mbar（100Pa）之间的气体压力与缓冲体积的泵。 清洁结构还可以包括气体返回系统。 版权所有（C）2007，JPO＆INPIT

    Contamination barrier equipped with extendable thin film
    2.
    发明专利
    Contamination barrier equipped with extendable thin film 有权
    污染障碍物配有可扩展的薄膜

    公开(公告)号：JP2004214656A

    公开(公告)日：2004-07-29

    申请号：JP2003426987

    申请日：2003-12-24

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BAKKER LEVINUS PETER ,  DIERICHS MARCEL MATHIJS THEODO ,  FRERIKS JOHANNES MARIA ,  SCHUURMANS FRANK JEROEN PIETER ,  VIJFVINKEL JAKOB ,  BOX WILHELMUS JOSEPHUS

    IPC: G21K1/00 ,  G03F7/20 ,  G21K3/00 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

    CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

    Abstract: PROBLEM TO BE SOLVED: To provide a contamination barrier minimizing undesirable deformation of thin films, which is related to a foil trap for a lithographic projection apparatus.
    SOLUTION: This foil trap has an open structure which transmits radiation from an EUV source or the like without interference. The foil trap is equipped with thin films positioned to trap scrap particles from a radiation source. The thin films extend in the radius direction from the foil trap axis. To avoid mechanical stress, the thin films are connected to one or both of the grooves of rings so that they can slide. This structure allows the thin films to extend easily and avoids mechanical stress, resulting in no deformation in the thin films. At least one of the outer ends of the thin films is thermally connected to the rings. These rings can be cooled with a cooling system. In a preferred embodiment, the foil trap is equipped with a shield which prevents the inner ring from being irradiated with an EUV beam.
    COPYRIGHT: (C)2004,JPO&NCIPI

    Abstract translation: 要解决的问题：提供减少薄膜不期望的变形的污染屏障，这与用于光刻投影装置的箔陷阱有关。 解决方案：该箔阱具有开放的结构，其能够在不受干扰的情况下传输来自EUV源等的辐射。 箔陷阱配备有薄膜，定位成从辐射源捕获废料颗粒。 薄膜从箔陷阱轴线沿半径方向延伸。 为了避免机械应力，薄膜连接到环的一个或两个槽，使得它们可以滑动。 这种结构允许薄膜容易地延伸并避免机械应力，导致薄膜没有变形。 薄膜的至少一个外端热连接到环上。 这些环可以用冷却系统冷却。 在优选实施例中，箔捕获器配备有防止内环被EUV射束照射的护罩。 版权所有（C）2004，JPO＆NCIPI

Patent Agency Ranking