公开(公告)号：NL2008168A

公开(公告)日：2012-08-28

申请号：NL2008168

申请日：2012-01-24

Applicant: ASML NETHERLANDS BV

Inventor： LYULINA IRINA ,  SIMONS HUBERTUS ,  TENNER MANFRED ,  HERES PIETER ,  KEMENADE MARC ,  SANDEN STEFAN ,  SLOTBOOM DAAN

IPC: G03F7/20

Abstract: Estimating model parameters of a lithographic apparatus and controlling lithographic processing by a lithographic apparatus includes performing an exposure using a lithographic apparatus projecting a pattern onto a wafer. A set of predetermined wafer measurement locations is measured. Predetermined and measured locations of the marks are used to generate radial basis functions. Model parameters of said substrate are calculated using the generated radial basis functions as a basis function across said substrate. Finally, the estimated model parameters are used to control the lithographic apparatus in order to expose the substrate.