Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号:JP2010050455A

    公开(公告)日:2010-03-04

    申请号:JP2009187914

    申请日:2009-08-14

    Abstract: PROBLEM TO BE SOLVED: To provide a temperature sensor which measures a temperature of immersion liquid at a position where the immersion liquid is supplied. SOLUTION: The reading of the temperature sensor is used to control the magnitude of heat input to the immersion liquid using a heater and/or cooler. A controller is used to calculate the calibration error of the temperature sensor relative to a temperature sensor that is provided upstream. The controller uses readings of the temperature difference between the two temperature sensors at one or more mass flow rates in order to estimate the temperature difference between the two temperature sensors at an infinite mass flow rate. The temperature difference at the infinite mass flow rate is estimated to be the temperature calibration error of the temperature sensor to measure the temperature of immersion liquid at a position where the immersion liquid is supplied relative to the upstream temperature sensor. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种温度传感器,其测量浸没液体在供应浸渍液体的位置的温度。 解决方案:读取温度传感器用于使用加热器和/或冷却器来控制输入到浸没液体的热量大小。 控制器用于计算温度传感器相对于上游设置的温度传感器的校准误差。 控制器以一个或多个质量流量使用两个温度传感器之间的温度差的读数,以便以无限质量流率估计两个温度传感器之间的温差。 在无限质量流量下的温度差估计为温度传感器的温度校准误差,用于测量在相对于上游温度传感器供应浸没液体的位置处的浸液的温度。 版权所有(C)2010,JPO&INPIT

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