公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2009081465A

公开(公告)日：2009-04-16

申请号：JP2008332589

申请日：2008-12-26

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： VAN EMPEL TJARKO ADRIAAN R ,  LOOPSTRA ERIK ROELOF ,  VAN DER NET ANTONIUS J ,  VAN DE VIJVER YURI JOHANNES G ,  GELLRICH BERNARD ,  JANSEN BAUKE ,  SANDERSE RENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device provided with a projection column having a gas-regulated environment that is hardly affected by the fluctuation of an ambient atmosphere.
SOLUTION: The lithographic device is disclosed. The lithographic device includes a projection system configured to project a patternized radiation beam on the target portion of a substrate. The projection system includes a housing and a plurality of optical elements disposed in the housing. In addition, the lithographic device includes an inlet for supplying a regulated gas to the housing and a gas discharge section for discharging the regulated gas from the housing to create the gas-regulated environment. At least one gate for making the gas-regulated environment communicate with the ambient atmosphere is disposed. The gate is disposed to perform the predetermined leakage of the regulated gas to the ambient atmosphere.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种设置有几乎不受环境大气波动影响的气体调节环境的投影柱的光刻设备。 解决方案：公开了光刻设备。 光刻设备包括投影系统，其被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和设置在壳体中的多个光学元件。 此外，平版印刷装置包括用于将调节气体供应到壳体的入口和用于从壳体排出调节气体以产生气体调节环境的气体排出部分。 设置用于使气体调节环境与环境大气连通的至少一个门。 门被设置为执行经调节的气体到周围大气的预定泄漏。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2010074159A

公开(公告)日：2010-04-02

申请号：JP2009208753

申请日：2009-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet on a final optical element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. A wet gas space for confining a wet gas is demarcated among the projection system, the liquid confinement structure, and the immersion liquid in the immersion space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低液滴对最终光学元件的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在投影系统，液体限制结构和浸没空间中的浸没液体之间划定用于限制湿气体的湿气空间。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006041522A

公开(公告)日：2006-02-09

申请号：JP2005211635

申请日：2005-07-21

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： VAN EMPEL TJARKO ADRIAAN R ,  LOOPSTRA ERIK ROELOF ,  VAN DER NET ANTONIUS J ,  VAN DE VIJVER YURI JOHANNES G ,  GELLRICH BERNARD ,  JANSEN BAUKE ,  SANDERSE RENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device provided with a projection column having a gas-regulated environment that is hardly affected by the fluctuation of an ambient atmosphere.
SOLUTION: The lithographic device is disclosed. The lithographic device includes a projection system configured to project a patternized radiation beam on the target portion of a substrate. The projection system includes a housing and a plurality of optical elements disposed in the housing. In addition, the lithographic device includes an inlet for supplying a regulated gas to the housing and a gas discharge section for discharging the regulated gas from the housing to create the gas-regulated environment. At least one gate for making the gas-regulated environment communicate with the ambient atmosphere is disposed. The gate is disposed to perform the predetermined leakage of the regulated gas to the ambient atmosphere.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有几乎不受环境大气波动影响的气体调节环境的投影柱的光刻设备。 解决方案：公开了光刻设备。 光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和设置在壳体中的多个光学元件。 此外，平版印刷装置包括用于将调节气体供应到壳体的入口和用于从壳体排出调节气体以产生气体调节环境的气体排出部分。 设置用于使气体调节环境与环境大气连通的至少一个门。 门被设置为执行经调节的气体到周围大气的预定泄漏。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011029599A

公开(公告)日：2011-02-10

申请号：JP2010107057

申请日：2010-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  CASIMIRI ERIC WILLEM FELIX

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a system which reduces pollution in an immersion lithographic apparatus, and reduces an interruption time for cleaning the immersion lithographic apparatus if not eliminated.
SOLUTION: A cleaner (for instance, an active cleaning agent) is added to immersion liquid in order to clean and/or prevent accumulation of pollution during exposure of a substrate to clean the immersion lithographic apparatus. For the cleaner, a surface-active agent, a cleaning agent, soap, an acid, an alkali, a solvent (nonpolar organic solvent, polar organic solvent or the like), another optional cleaning agent appropriate for a lithographic apparatus or the like is used. The cleaning agent may be present at a concentration

Abstract translation: 要解决的问题：提供一种减少浸没式光刻设备中的污染的系统，并且如果不消除浸没式光刻设备的清洁，减少清洗中断时间。

解决方案：为了清洁和/或防止在曝光基材以清洁浸没式光刻设备时的污染积聚，将清洁剂（例如，活性清洁剂）加入到浸液中。 对于清洁剂，表面活性剂，清洁剂，皂，酸，碱，溶剂（非极性有机溶剂，极性有机溶剂等），适用于光刻设备的其它任选的清洁剂等是 用过的。 清洁剂可以以<300ppb的浓度存在。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2008294439A

公开(公告)日：2008-12-04

申请号：JP2008120668

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic equipment. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic equipment is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供易于有效清洁的平版印刷设备，并提供清洁方法以有效地清洁液浸光刻设备。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008277819A

公开(公告)日：2008-11-13

申请号：JP2008114096

申请日：2008-04-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can be cleaned easily and effectively, and to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool that cleans the surface of a liquid containment system of the immersionm lithoraphic apparatus is disclosed and the liquid containment system has an aperture, through which radial beams can pass the liquid containment system of an immersion lithographic apparatus; the cleaning tool commprises an sonic transducer; a reservoir that holds liquid between the sonic transducer and the surface to be cleaned, and a barrier disposed under the aperture within the reservoir, in order to form a shield against sonic waves, when it is used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效清洁浸没式光刻设备的方法。 公开了一种清洁浸渍液体装置的液体容纳系统的表面的清洁工具，并且液体容纳系统具有孔，径向束可以通过该孔径通过浸没式光刻设备的液体容纳系统; 清洁工具会使声音传感器发生变化; 储存器，其在声音换能器和待清洁表面之间保持液体，以及设置在储存器内的孔下方的屏障，以便在使用时形成防止声波的屏蔽。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2014039069A

公开(公告)日：2014-02-27

申请号：JP2013243543

申请日：2013-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or a boundary surface between gas/liquid and a final element on the final element, or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises: a projection system; and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure, and a substrate and/or a substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets on a final element of the projection system or substantially avoiding such droplet formation.

Abstract translation: 要解决的问题：提供一种系统，以减少液体和/或气体/液体与最终元件上的最终元件之间的边界表面的影响，或基本上避免这种液滴形成。解决方案：光刻设备包括：投影 系统; 以及液体限制结构，其被配置为至少部分地将浸没液体限制在由所述投影系统，所述液体限制结构以及衬底和/或衬底台限定的浸没空间中。 在光刻设备中，采取手段来例如减少液滴对投影系统的最终元件的影响或基本上避免这种液滴形成。

公开(公告)号：JP2013016865A

公开(公告)日：2013-01-24

申请号：JP2012227010

申请日：2012-10-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or an interface between gas/liquid and a final element on the final element or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets lying on a final element of the projection system or substantially avoiding such droplet formation.

Abstract translation: 要解决的问题：提供一种降低液滴和/或气体/液体与最终元件上的最终元件之间的界面的作用的系统，或基本避免这种液滴的形成。 解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。 在光刻设备中，采取手段来例如降低位于投影系统的最终元件上的液滴的作用或基本上避免这种液滴形成。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011187971A

公开(公告)日：2011-09-22

申请号：JP2011093700

申请日：2011-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEONARDUS CUIJPERS

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种容易且有效地清洁的光刻设备，并提供一种有效地清洁液浸式光刻设备的清洁方法。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2011，JPO＆INPIT