公开(公告)号：JP2004289123A

公开(公告)日：2004-10-14

申请号：JP2003401536

申请日：2003-12-01

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MULDER HEINE MELLE ,  HOEGEE JAN ,  KOOLEN ARMAND EUGENE ALBERT

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70108 ,  G03F7/70133 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To obtain the information of an intensity distribution in a pupil plane without disrupting the operability of a lithographic apparatus and to adjust the configuration of an illumination system at any time for controlling a desired intensity distribution in the pupil plane dependent on measured information about the intensity distribution.
SOLUTION: A beam splitter is permanently located in a beam near the pupil plane. The beam splitter splits off an auxiliary beam, which is used to measure information about the spacial intensity distribution of the beam at the pupil plane. Preferably, the measured position dependence in the auxiliary beam may be deconvoluted using boundary conditions inherent to the illuminator to compensate for offset between the pupil plane and a detection element. The measured position dependence may be used to control parameters of an optical element that manipulates the position dependence in the pupil plane. An example of such an optical element is a matrix of elements that controllably steer the direction of parts of the beam. Thus a continuous feedback loop may be realized.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了获得光瞳平面中的强度分布的信息而不破坏光刻设备的可操作性，并且随时调整照明系统的配置以控制瞳孔平面中的期望的强度分布 取决于关于强度分布的测量信息。 解决方案：分束器永久地位于瞳孔平面附近的光束中。 分束器分离辅助光束，其用于测量关于光束在瞳孔平面处的空间强度分布的信息。 优选地，可以使用照明器固有的边界条件对辅助光束中的测量位置依赖性进行解卷积，以补偿光瞳面与检测元件之间的偏移。 测量的位置依赖性可以用于控制操纵光瞳平面中的位置依赖性的光学元件的参数。 这种光学元件的示例是可控制地引导梁的部分的方向的元件的矩阵。 因此，可以实现连续反馈回路。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：DE60120282D1

公开(公告)日：2006-07-20

申请号：DE60120282

申请日：2001-07-03

Applicant: ASML NETHERLANDS BV

Inventor： KRIKKE JAN JAAP ,  EURLINGS MARKUS FRANCISCUS ANT ,  HOEGEE JAN ,  VAN DER VEEN PAUL

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.

公开(公告)号：SG145535A1

公开(公告)日：2008-09-29

申请号：SG2003070943

申请日：2003-12-01

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE MELLE ,  HOEGEE JAN ,  KOOLEN ARMAND EUGENE ALBERT

IPC: G03F7/20 ,  H01L21/027

Abstract: In a lithographic apparatus the angle dependence of the intensity distribution of a projection beam (PB) at a substrate is controlled. A beam splitter (181) is permanently located in the beam near a pupil plane (14). The beam splitter splits off an auxiliary beam, which is used to measure information about the spatial intensity distribution of the beam at the pupil plane. Preferably, the measured position dependence in the auxiliary beam is deconvoluted using boundary conditions inherent to the illuminator to compensate for offset between the pupil plane and a detection element (183). The measured position dependence is used to control parameters of an optical element that manipulates the position dependence in the pupil plane. An example of such an optical element is a matrix of elements that controllably steer the direction of parts of the beam. Thus a continuous feedback loop may be realized.

公开(公告)号：DE60120282T2

公开(公告)日：2007-05-31

申请号：DE60120282

申请日：2001-07-03

Applicant: ASML NETHERLANDS BV

Inventor： KRIKKE JAN JAAP ,  EURLINGS MARKUS FRANCISCUS ANT ,  HOEGEE JAN ,  VAN DER VEEN PAUL

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.