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    Method of determining parameter for lithographic projection, computer system and computer program therefor, method for manufacturing device, and device manufactured by the method
    1.
    发明专利
    Method of determining parameter for lithographic projection, computer system and computer program therefor, method for manufacturing device, and device manufactured by the method 有权
    确定光刻投影参数的方法，计算机系统及其计算机程序，制造装置的方法和由该方法制造的装置

    公开(公告)号：JP2004191981A

    公开(公告)日：2004-07-08

    申请号：JP2003409103

    申请日：2003-12-08

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： EURLINGS MARKUS FRANCISCUS ANT ,  KOOLEN ARMAND EUGENE ALBERT

    IPC: G03F1/08 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70125 ,  G03F7/70441

    Abstract: PROBLEM TO BE SOLVED: To provide a method for determining parameters for projection of a lithographic projecting apparatus to be used for manufacturing a device, in particular, determining the intensity distribution of a radiation source, optical proximity correction rules and process windows by using simple software. SOLUTION: The method includes processes of: selecting a plurality of features of a pattern to be imaged; notionally dividing radiation into a plurality of radiation source elements; calculating the process window for each selected feature with respect to each radiation source element and determining the optical proximity correction rules that optimize the overlap of the calculated process windows; and selecting the radiation source elements satisfying the specified criteria by the overlap of the process windows and the optical proximity correction rules. The selected radiation source elements generate the intensity distribution of the radiation source. A substrate can be exposed in the process windows by using a patterning means having a pattern corrected in accordance with the determined optical proximity correction rules and by using the radiation source having the intensity distribution of the radiation source. COPYRIGHT: (C)2004,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种用于确定用于制造装置的光刻投影装置的投影参数的方法，特别是确定辐射源的强度分布，光学邻近校正规则和处理窗口 使用简单的软件。 解决方案：该方法包括以下处理：选择要成像的图案的多个特征; 将辐射意图划分成多个辐射源元件; 针对每个辐射源元件计算每个所选特征的处理窗口，并且确定优化所计算的处理窗口的重叠的光学邻近校正规则; 以及通过处理窗口和光学邻近校正规则的重叠来选择满足指定标准的辐射源元件。 所选择的辐射源元件产生辐射源的强度分布。 通过使用具有根据所确定的光学邻近校正规则校正的图案的图案化装置以及通过使用具有辐射源的强度分布的辐射源，可以在工艺窗口中曝光基板。 版权所有（C）2004，JPO＆NCIPI

    Lithographic apparatus and method
    4.
    发明专利
    Lithographic apparatus and method 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2008258605A

    公开(公告)日：2008-10-23

    申请号：JP2008072785

    申请日：2008-03-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MULDER HEINE MELLE ,  BASELMANS JOHANNES JACOBUS MAT ,  ENGELEN ADRIANUS FRANCISCUS PE ,  EURLINGS MARKUS FRANCISCUS ANT ,  VAN GREEVENBROEK HENDRIKUS ROB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DER VEEN PAUL ,  ENDENDIJK WILFRED EDWARD

    IPC: H01L21/027

    CPC classification number: G03F7/70291 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70516

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which applies a desired angular intensity distribution to a radiation beam, and includes compensation for its undesired properties, adjustment of properties of the radiation beam to improve lithography and the like. SOLUTION: The method comprises controlling an array (of mirrors) of individually controllable elements and related optical components of an illumination system to convert the radiation beam into a desired illumination mode, wherein the controlling step includes a step of allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme selected as to provide a desired modification of one or more properties of the illumination mode, or the radiation beam, or both. The method further includes: patterning the radiation beam with a pattern in its cross-section to form a patterned radiation beam; and projecting the patterned radiation beam onto a target portion of a substrate. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种对辐射束施加期望的角度强度分布的光刻设备，并且包括对其不期望的性质的补偿，辐射束的性质的调整以改善光刻等。 解决方案：该方法包括控制照明系统的独立可控元件和相关光学部件的阵列（反射镜阵列），以将辐射束转换成期望的照明模式，其中控制步骤包括分配不同的可单独控制的步骤 元件到照明模式的不同部分，根据被选择为提供照明模式的一个或多个属性或者辐射束或两者的期望修改的分配方案。 该方法还包括：以其横截面中的图案图案化辐射束以形成图案化的辐射束; 并将图案化的辐射束投射到衬底的目标部分上。 版权所有（C）2009，JPO＆INPIT

    Lithography equipment and device manufacturing method
    5.
    发明专利
    Lithography equipment and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2007227918A

    公开(公告)日：2007-09-06

    申请号：JP2007035613

    申请日：2007-02-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MULDER HEINE MELLE ,  EURLINGS MARKUS FRANCISCUS ANT

    IPC: H01L21/027 ,  G02B5/30

    CPC classification number: G03F7/70191 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70566

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography device constituted such that a flexible polarization illumination mode is created, and a method of manufacturing the device.
    SOLUTION: The reflection element 14b of an array 14 reflects a sub beam toward an intermediate surface 16 via a redirect optical system 15. The redirect optical system (for example, a focusing lens) allows the sub beam to face with the determined region of the intermediate surface of an illuminator. A cross section 16 may coincide with a pupil surface functioning as a secondary radiation source. Further, the reaction elements 14c and 14d reflect two other illustrated sub beams toward the other region of the section 16 via the redirect optical system 15. Almost every space intensity distribution in the cross section can be produced by determining the region of the section 16 on which the sub beam is incident by adjusting the alignment of the reflection elements 14a and 14e.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种构成使柔性偏振照明模式产生的光刻装置及其制造方法。 解决方案：阵列14的反射元件14b经由重定向光学系统15将子光束反射到中间表面16.重定向光学系统（例如，聚焦透镜）允许子光束面对所确定的 照明器的中间表面的区域。 横截面16可以与用作次级辐射源的瞳孔表面重合。 此外，反应元件14c和14d经由重定向光学系统15将另外示出的子光束反射到部分16的另一区域。横截面中几乎每个空间强度分布可以通过确定部分16的区域在 子光束通过调整反射元件14a和14e的对准而入射。 版权所有（C）2007，JPO＆INPIT

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    8.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG135130A1

    公开(公告)日：2007-09-28

    申请号：SG2007011836

    申请日：2007-02-15

    Applicant: ASML NETHERLANDS BV

    Inventor： MULDER HEINE MELLE ,  EURLINGS MARKUS FRANCISCUS ANT

    Abstract: A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub- beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.

    9.
    发明专利
    未知

    公开(公告)号：DE60120282T2

    公开(公告)日：2007-05-31

    申请号：DE60120282

    申请日：2001-07-03

    Applicant: ASML NETHERLANDS BV

    Inventor： KRIKKE JAN JAAP ,  EURLINGS MARKUS FRANCISCUS ANT ,  HOEGEE JAN ,  VAN DER VEEN PAUL

    IPC: G03F7/20 ,  H01L21/027

    Abstract: A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.

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