公开(公告)号：NL2006625A

公开(公告)日：2011-11-29

申请号：NL2006625

申请日：2011-04-19

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  MULDER HEINE ,  VEEN PAUL ,  ENDENDIJK WILFRED ,  BOUMAN WILLEM ,  DRIEENHUIZEN BERT ,  VERBEECK JOZEF ,  DASSEN MARC ,  HOLLINK THIJS

IPC: G03F7/20

公开(公告)号：NL2009168A

公开(公告)日：2013-02-21

申请号：NL2009168

申请日：2012-07-11

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE ,  HANSEN STEVEN ,  HOLLINK THIJS

IPC: G03F7/20

Abstract: A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.