公开(公告)号：NL2009666A

公开(公告)日：2013-05-23

申请号：NL2009666

申请日：2012-10-19

Applicant: ASML NETHERLANDS BV

Inventor： VEEN PAUL

IPC: G03F7/20

公开(公告)号：NL2006196A

公开(公告)日：2011-09-13

申请号：NL2006196

申请日：2011-02-14

Applicant: ASML NETHERLANDS BV

Inventor： STOLK ROLAND ,  VEEN PAUL

IPC: G03F7/20

公开(公告)号：NL2006625A

公开(公告)日：2011-11-29

申请号：NL2006625

申请日：2011-04-19

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  MULDER HEINE ,  VEEN PAUL ,  ENDENDIJK WILFRED ,  BOUMAN WILLEM ,  DRIEENHUIZEN BERT ,  VERBEECK JOZEF ,  DASSEN MARC ,  HOLLINK THIJS

IPC: G03F7/20

公开(公告)号：NL2004942A

公开(公告)日：2011-01-31

申请号：NL2004942

申请日：2010-06-22

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  VEEN PAUL ,  GODFRIED HERMAN

IPC: G03F7/20

Abstract: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.