公开(公告)号：NL2006625A

公开(公告)日：2011-11-29

申请号：NL2006625

申请日：2011-04-19

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  MULDER HEINE ,  VEEN PAUL ,  ENDENDIJK WILFRED ,  BOUMAN WILLEM ,  DRIEENHUIZEN BERT ,  VERBEECK JOZEF ,  DASSEN MARC ,  HOLLINK THIJS

IPC: G03F7/20

公开(公告)号：NL2005548A

公开(公告)日：2011-05-23

申请号：NL2005548

申请日：2010-10-19

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  DIERICHS MARCEL ,  GODFRIED HERMAN

IPC: G02B27/09 ,  G03F7/20

Abstract: A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation which is output from the first homogenizer stage.

公开(公告)号：NL2004942A

公开(公告)日：2011-01-31

申请号：NL2004942

申请日：2010-06-22

Applicant: ASML NETHERLANDS BV

Inventor： CLAESSENS BERT ,  VEEN PAUL ,  GODFRIED HERMAN

IPC: G03F7/20

Abstract: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.