公开(公告)号：JP2010199581A

公开(公告)日：2010-09-09

申请号：JP2010031894

申请日：2010-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  GILISSEN NOUD JAN ,  COMPEN RENE THEODORUS PETRUS ,  KENNON JAMES

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: B24B31/112 ,  B24B35/00 ,  G03B27/58 ,  G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which prevents unevenness in supporting a substrate. SOLUTION: A lithographic projection apparatus includes: a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of the substrate; a support table including protrusions to support an article; a detector to detect height deviations of the protrusions; a material removing device arranged to modify a height of protrusion material; a controller coupled between the detector and the material removing device. The material removing device includes a removal tool selected from a group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止支撑基板的不均匀性的光刻设备。 光刻投影设备包括：光束产生系统，用于提供辐射束，对辐射束进行图案化，并将图案化的光束投射到基板的目标部分上; 支撑台，其包括用于支撑制品的突起; 用于检测突起的高度偏差的检测器; 布置成改变突起材料的高度的材料去除装置; 耦合在检测器和材料去除装置之间的控制器。 材料去除装置包括从由机械抛光装置，磁流变整理工具和单点或多点金刚石工具组成的组中选择的清除工具。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：NL2004153A

公开(公告)日：2010-08-25

申请号：NL2004153

申请日：2010-01-27

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  GILISSEN NOUD ,  COMPEN RENE ,  KENNON JAMES

IPC: G03F7/20