公开(公告)号：NL2006285A

公开(公告)日：2011-10-03

申请号：NL2006285

申请日：2011-02-23

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  KUIT JAN JAAP ,  MULKENS JOHANNES ,  ZAAL KOEN

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2010103A

公开(公告)日：2013-07-18

申请号：NL2010103

申请日：2013-01-10

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  DONDERS SJOERD ,  ZAAL KOEN ,  CADEE THEODORUS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2006514A

公开(公告)日：2011-11-14

申请号：NL2006514

申请日：2011-04-01

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  ZAAL KOEN ,  HOL TIMO ,  KOOT MICHAEL WILHELMUS THEODORUS

IPC: G03F7/20 ,  H01L21/68

Abstract: An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member.

公开(公告)号：NL2008110A

公开(公告)日：2012-08-21

申请号：NL2008110

申请日：2012-01-12

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BEEMS MARCEL ,  CADEE THEODORUS ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2008500A

公开(公告)日：2012-10-23

申请号：NL2008500

申请日：2012-03-16

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  HOEKS MARTINUS ,  CADEE THEODORUS

IPC: G03F7/20

Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

公开(公告)号：NL2008199A

公开(公告)日：2012-08-29

申请号：NL2008199

申请日：2012-01-30

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  LAFARRE RAYMOND

IPC: G03F7/20

公开(公告)号：NL2006699A

公开(公告)日：2011-12-06

申请号：NL2006699

申请日：2011-05-02

Applicant: ASML NETHERLANDS BV

Inventor： AKKERMANS JOHANNES ,  CADEE THEODORUS ,  CLIJSEN GEORGE

IPC: G03F7/20 ,  H01L21/68

Abstract: A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.

公开(公告)号：NL2004153A

公开(公告)日：2010-08-25

申请号：NL2004153

申请日：2010-01-27

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  GILISSEN NOUD ,  COMPEN RENE ,  KENNON JAMES

IPC: G03F7/20

公开(公告)号：NL2003846A

公开(公告)日：2010-06-22

申请号：NL2003846

申请日：2009-11-23

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  WIJST MARC ,  CADEE THEODORUS ,  JACOBS FRANSISCUS ,  VALENTIN CHRISTIAAN LOUIS ,  BAGGEN MARCEL ,  BUTLER HANS ,  COX HENRIKUS ,  EIJK JAN ,  JEUNINK ANDRE ,  KEMPER NICOLAAS ,  SCHMIDT ROBERT-HAN MUNNIG ,  PASCH ENGELBERTUS

IPC: G03F9/00

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

公开(公告)号：NL2008833A

公开(公告)日：2012-12-28

申请号：NL2008833

申请日：2012-05-16

Applicant: ASML NETHERLANDS BV

Inventor： HUANG YANG-SHAN ,  BUTLER HANS ,  EIJK JAN ,  HOL SVEN ANTOIN JOHAN ,  PASCH ENGELBERTUS ,  VEN BASTIAAN ,  VERMEULEN JOHANNES ,  CADEE THEODORUS ,  LEEUWEN ROBBERT

IPC: G03F7/20 ,  H01L21/68