Radiation source, lithography arrangement, and device manufacturing method
    2.
    发明专利
    Radiation source, lithography arrangement, and device manufacturing method 有权
    辐射源,光栅装置和器件制造方法

    公开(公告)号:JP2004165160A

    公开(公告)日:2004-06-10

    申请号:JP2003376283

    申请日:2003-09-30

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation source that improves the conversion efficiency of electric energy into radiation.
    SOLUTION: A radiation source unit comprises an anode and a cathode that are configured and arranged to create discharge in a substance in a space between the anode and the cathode to form plasma so as to generate electromagnetic radiation. The liquid may comprises xenon, indium, lithium, tin, or an arbitrary suitable material. In order to improve the conversion efficiency, the radiation source unit is constructed to have low inductance and operated with the minimum of plasma. In order to improve heat dissipation, a liquid circulation system is created in the radiation source space and a wick by using a fluid in both vapor and liquid phases. In order to prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the generation of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation.
    COPYRIGHT: (C)2004,JPO

    Abstract translation: 要解决的问题:提供一种提高电能转换成辐射的转换效率的辐射源。 解决方案:辐射源单元包括阳极和阴极,其构造和布置成在阳极和阴极之间的空间中的物质中产生放电,以形成等离子体,从而产生电磁辐射。 液体可以包括氙,铟,锂,锡或任意合适的材料。 为了提高转换效率,辐射源单元被构造为具有低电感并且以最小的等离子体运行。 为了改善散热,通过在气相和液相中使用流体,在辐射源空间和芯中产生液体循环系统。 为了防止污染进入光刻投影设备,辐射源单元被构造成使污染物的产生最小化,并且采用陷阱来捕获污染物而不干扰所发射的辐射。 版权所有(C)2004,JPO

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