公开(公告)号：JP2011082549A

公开(公告)日：2011-04-21

申请号：JP2010267278

申请日：2010-11-30

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： JAN JAAP KUIT ,  SCHAAP PETER ,  ROUX STEPHEN ,  O'CONNER GEOFFREY

IPC: H01L21/027 ,  H01L21/683

CPC classification number: G03F7/70741 ,  G03F7/7075 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, a method of manufacturing a device, and a device manufactured by the same.
SOLUTION: The lithography apparatus 1 configured to transfer a pattern from a pattern forming structure to a substrate has a substrate holder 4 configured to hold the substrate, and a substrate thermoregulator configured to adjust the temperature of the substrate before movement and during movement so that it may be made substantially in agreement with the temperature of the substrate holder 4.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，该设备的制造方法以及由其制造的设备。 解决方案：被配置为将图案从图案形成结构传送到基板的光刻设备1具有被配置为保持基板的基板保持件4和构造成在移动之前和移动期间调节基板的温度的基板调温器 使得其可以基本上与衬底保持器4的温度一致。版权所有：（C）2011，JPO和INPIT

公开(公告)号：JP2007096309A

公开(公告)日：2007-04-12

申请号：JP2006260286

申请日：2006-09-26

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールデイング エヌ.ブイ.

Inventor： JAN JAAP KUIT ,  SCHAAP PETER ,  ROUX STEPHEN ,  O'CONNER GEOFFREY

IPC: H01L21/027

CPC classification number: G03F7/70741 ,  G03F7/7075 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide: a lithography apparatus; method of manufacturing a device; and a device manufactured by the same. SOLUTION: The lithography apparatus configured to transfer a pattern from a pattern forming structure to a substrate has a substrate holder configured to hold the substrate, and a substrate thermoregulator configured to adjust the temperature of the substrate before movement and during movement so that it may be made substantially in agreement with the temperature of the substrate holder. Further, it has a pattern forming structure holder configured to hold the pattern forming structure, and a pattern forming structure thermoregulator configured to adjust the temperature of the pattern forming structure before the movement of the pattern forming structure to the pattern forming structure holder. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供：光刻设备; 制造装置的方法; 和由其制造的装置。 解决方案：构造成将图案从图案形成结构转移到衬底的光刻设备具有被配置为保持衬底的衬底保持器和被配置为在移动之前和移动期间调节衬底的温度的衬底温度调节器，使得 它可以基本上与衬底保持器的温度一致。 此外，其具有构造成保持图案形成结构的图案形成结构保持器，以及构造成在图案形成结构移动到图案形成结构保持器之前调整图案形成结构的温度的图案形成结构调温器。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006352115A

公开(公告)日：2006-12-28

申请号：JP2006157945

申请日：2006-06-07

Applicant: ASML NETHERLANDS BV

Inventor： BAGGEN MARCEL KOENRAAD MARIE ,  BIJVOET DIRK-JAN ,  LAMBERTUS DONDERS SJOERD NICOL ,  HOOGKAMP JAN FREDERIK ,  JANSEN ALBERT JOHANNES MARIA ,  KUIT JAN JAAP ,  SCHAAP PETER ,  JANSSEN JOEP ,  JASPERSE HUBRECHT BASTIAAN ,  VAN DER WEL ARJAN M

IPC: H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To solve such problems that: degraded dynamic behaviors may prolong a stable time (i.e. the desired time for bringing the position of an object table into a desired error bandwidth); larger forces are desirably provided in order to obtain the desired acceleration of a patterning device or a substrate; and the positioning accuracy of the object is affected as a result of that. SOLUTION: There is described a stage apparatus for displacing an object having a substantially flat surface. The stage apparatus is provided with an object table for supporting the object and a positioning device for displacing the object table in a first direction. The stage apparatus is further provided with a clamping device for clamping the object to the object table by a first clamping force that is controlled by an electronic control unit on the basis of the condition of the object. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：SG11201609284TA

公开(公告)日：2016-12-29

申请号：SG11201609284T

申请日：2015-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BERENDSEN CHRISTIANUS WILHELMUS JOHANNES ,  BECKERS MARCEL ,  CASTELIJNS HENRICUS JOZEF ,  GERAETS HUBERTUS ANTONIUS ,  KOEVOETS ADRIANUS HENDRIK ,  LEVASIER LEON MARTIN ,  SCHAAP PETER ,  STREEFKERK BOB ,  TROMP SIEGFRIED ALEXANDER

IPC: G03F7/20

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

公开(公告)号：SG134294A1

公开(公告)日：2007-08-29

申请号：SG2007006505

申请日：2007-01-26

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG

Inventor： LOOPSTRA ERIK ROELOF ,  ENGELEN ADRIANUS FRANCISCUS PE ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  RUBINGH MARIA JOHANA AGNES ,  HAZENBERG JOHANNES MARTINUS AN ,  JORRITSMA LAURENTIUS CATRINUS ,  DE KLERK JOHANNES WILHELMUS ,  GEUPPERT BERNHARD ,  SCHAAP PETER ,  VAN BEUZEKOM AART ADRIANUS ,  MANDIGERS PETRUS FRANCISCUS WI ,  SORG FRANZ ,  DEUFEL PETER

Abstract: A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

公开(公告)号：SG131089A1

公开(公告)日：2007-04-26

申请号：SG2006066435

申请日：2006-09-25

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： KUIT JAN JAAP ,  SCHAAP PETER ,  ROUX STEPHEN ,  OAECONNOR GEOFFREY

Abstract: A lithographic apparatus (1) arranged to transfer a pattern from a patterning structure (MA) onto a substrate (W) is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder. Besides, there is provided a lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate, comprising: a first patterning structure holder (MT) configured to hold a patterning structure (MA); a patterning structure temperature conditioner (140) configured to condition a temperature of the patterning structure prior to a transfer of the patterning structure to the patterning structure holder, wherein the patterning structure temperature conditioner is provided with a second patterning structure holder (113); and at least one system (125,126) to thermally condition the first and second patterning structure holder to substantially the same temperature.