公开(公告)号：JP2006222426A

公开(公告)日：2006-08-24

申请号：JP2006028417

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  LEONARDUS FRANKEN JOHANNES CHR ,  JOSEPHINA MOORS JOHANNES HUBER ,  SPEE CAROLUS IDA MARIA ANTONIU ,  WASSINK ARNOUD C ,  ANTONIUS BROM PAUL P A

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a method for removal of deposition on an optical element of a lithographic apparatus, and the lithographic apparatus. SOLUTION: The method for removal of deposition on a radiation collector of a lithographic apparatus includes a process of providing a gas barrier to the end of the radiation collector, thereby providing a radiation collector enclosure volume; a process of providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen, deuterium and/or tritium containing gas; and a process of removing at least part of the deposition from the radiation collector. The lithographic apparatus includes the radiation collector; a circumferential hull enclosing the radiation collector; and the gas barrier at the end of the radiation collector, thereby providing the radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet feeds a gas to the radiation collector enclosure volume and an outlet exhausts a gas from the radiation collector enclosure volume. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2007123874A

公开(公告)日：2007-05-17

申请号：JP2006283977

申请日：2006-10-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LEONARDUS FRANKEN JOHANNES CHR ,  STRUYCKEN ALEXANDER MATTHIJS ,  LEON JOSEPH MARIE VAN DEN SCHO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891 ,  F24J2/10 ,  F24J2/32 ,  F24J2/4621 ,  G02B7/1815 ,  G03F7/70175

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of removing a collector contaminant by a relatively simple method. SOLUTION: This lithography apparatus is equipped with a collector for receiving an irradiated beam from an irradiation source and transmitting the irradiated beam to a lighting system. In the collector, at least one of fluid duct is provided. The lithography apparatus has a temperature controller for heat-controlling the collector using the fluid duct of the collector. The temperature controller supplies a first fluid to the fluid duct during a first period and supplies a second fluid to the fluid duct at least during a second period. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供能够通过相对简单的方法去除集电极污染物的光刻设备。 解决方案：该光刻设备配备有用于从照射源接收照射光束并将照射的光束传输到照明系统的收集器。 在收集器中，提供至少一个流体导管。 光刻设备具有温度控制器，用于使用收集器的流体管道对收集器进行热控制。 温度控制器在第一时段期间将第一流体供应到流体管道，并且至少在第二时段期间将第二流体提供给流体管道。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005217398A

公开(公告)日：2005-08-11

申请号：JP2005007226

申请日：2005-01-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  LEONARDUS FRANKEN JOHANNES CHR ,  MICKAN UWE ,  VOORMA HARM-JAN

IPC: G02B17/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, a device manufacturing method for manufacturing a device with high precision, and a device manufactured by the same. SOLUTION: The lithography apparatus comprises: an illumination system IL for providing a projection beam of radiation PB; and a support structure MT for supporting a patterning means MA. The lithographic apparatus further comprises: a substrate table WT for holding a substrate W; a projection system PL for projecting the patterned beam onto a target portion of the substrate W; and a condenser which is structured to transmit a radiation R, received from a first radiation source SO, to the illumination system IL. The condenser K comprises at least one heater for heating the condenser when a condensing component receives substantially no radiation from the radiation source SO. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，用于制造高精度器件的器件制造方法及其制造方法。 光刻设备包括：照明系统IL，用于提供辐射PB的投影光束; 以及用于支撑图案形成装置MA的支撑结构MT。 光刻设备还包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及构造成将从第一辐射源SO接收的辐射R传送到照明系统IL的冷凝器。 冷凝器K包括至少一个用于加热冷凝器的加热器，当冷凝部件基本上不接收来自辐射源SO的辐射时。 版权所有（C）2005，JPO＆NCIPI