公开(公告)号：JP2008060570A

公开(公告)日：2008-03-13

申请号：JP2007217736

申请日：2007-08-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BAKKER LEVINUS P ,  SCHUURMANS FRANK JEROEN P

IPC: H01L21/027

CPC classification number: G03F7/70916 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which can reduce or prevent sputtering on optical component relevant to plasma.
SOLUTION: This lithography apparatus is a radiation source constituted so that the radiation for forming a radiation beam is emitted, wherein the radiation includes the radiation source which is a type of generating the plasma in a low-pressure environment in the lithography apparatus, and optical components constituted so that a pattern is given to a cross section of the radiation beam adjusted in order to form a radiation beam with the pattern, the radiation beam with the pattern is projected on a target portion of the substrate, and/or the radiation is detected. A plasma annihilation structure is provided in the optical components, and the plasma annihilation structure is constituted so as to cause the electron-ion recombination inside, above, and/or near the optical components.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够减少或防止与等离子体相关的光学部件上的溅射的光刻设备。 解决方案：该光刻设备是一种辐射源，其被构造成使得用于形成辐射束的辐射被发射，其中辐射包括在光刻设备中在低压环境中产生等离子体的辐射源 以及光学部件，其被构造成使得为了形成具有图案的辐射束而调节的辐射束的横截面被赋予图案，具有图案的辐射束被投影在基板的目标部分上，和/或 检测到辐射。 在光学部件中设置有等离子体湮灭结构，构成等离子体湮灭结构，以使光学部件的内部，上方和/或附近形成电子 - 离子复合。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006352081A

公开(公告)日：2006-12-28

申请号：JP2006093871

申请日：2006-03-30

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  VAN DER VELDEN MARC H L

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing sputtering caused by gas introduced to a projection beam optical path, and a method for manufacturing the apparatus. SOLUTION: The lithographic apparatus is arranged to project a beam from a radiation source to a substrate. The lithographic apparatus includes an optical element in an optical path of the beam, a gas inlet for introducing gas into the optical path of the beam so that the gas is ionized by the beam to a create electric field toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy that is greater than kinetic energy developed by ions of the gas in the electric fields for sputtering the optical element. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：JP2010045400A

公开(公告)日：2010-02-25

申请号：JP2009264762

申请日：2009-11-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  SCHUURMANS FRANK JEROEN PIETER ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  VAN DER VELDEN MARC H L

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which reduces sputtering due to gas that has been introduced in an optical path of a projection beam, and to provide a device manufacturing method. SOLUTION: The lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The lithographic apparatus includes an optical element in an optical path of the beam, a gas inlet for introducing gas into the optical path of the beam so that the gas will be ionized by the beam to create an electric field toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold value of kinetic energy for sputtering the optical element that is greater than a kinetic energy developed by ions of the gas in the electric field. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其减少由于在投影光束的光路中引入的气体引起的溅射，并提供器件制造方法。 解决方案：光刻设备被布置成将来自辐射源的光束投射到基板上。 光刻设备包括光束的光路中的光学元件，用于将气体引入光束的光路中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且 气体源耦合到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能的阈值，其大于由电场中的气体的离子产生的动能。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006222426A

公开(公告)日：2006-08-24

申请号：JP2006028417

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  LEONARDUS FRANKEN JOHANNES CHR ,  JOSEPHINA MOORS JOHANNES HUBER ,  SPEE CAROLUS IDA MARIA ANTONIU ,  WASSINK ARNOUD C ,  ANTONIUS BROM PAUL P A

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a method for removal of deposition on an optical element of a lithographic apparatus, and the lithographic apparatus. SOLUTION: The method for removal of deposition on a radiation collector of a lithographic apparatus includes a process of providing a gas barrier to the end of the radiation collector, thereby providing a radiation collector enclosure volume; a process of providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen, deuterium and/or tritium containing gas; and a process of removing at least part of the deposition from the radiation collector. The lithographic apparatus includes the radiation collector; a circumferential hull enclosing the radiation collector; and the gas barrier at the end of the radiation collector, thereby providing the radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet feeds a gas to the radiation collector enclosure volume and an outlet exhausts a gas from the radiation collector enclosure volume. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2011029653A

公开(公告)日：2011-02-10

申请号：JP2010211817

申请日：2010-09-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  WASSINK ARNOUD CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70916 ,  G03F7/70058

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that has an illumination system including a contaminant trapping system with improved efficiency as compared with conventional contaminant trapping systems. SOLUTION: The lithographic apparatus includes an illumination system for adjusting a radiation beam emitted substantially from a light emitting point LEP. The illumination system includes the contaminant trapping system CTS. The trapping system includes a contaminant trap CT having a central zone CZ and a peripheral zone PZ. The trap includes a plurality of platelets Pt that extend substantially outward through the peripheral zone. The light emitting point LEP exists on a plane where the platelets Pt overlap therewith. Each of the platelets Pt has a normal with respect to a component directed towards the central zone. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，该光刻设备具有与常规污染物捕获系统相比具有提高效率的污染物捕获系统的照明系统。 解决方案：光刻设备包括用于调节基本上从发光点LEP发射的辐射束的照明系统。 照明系统包括污染物捕集系统CTS。 捕集系统包括具有中心区CZ和周边区PZ的污染物陷阱CT。 捕集器包括基本上向外延伸穿过周边区域的多个血小板Pt。 发光点LEP存在于血小板Pt与其重叠的平面上。 每个血小板Pt相对于朝向中心区的部件是正常的。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007208239A

公开(公告)日：2007-08-16

申请号：JP2006343909

申请日：2006-12-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KLUNDER DERK JAN WILFRED ,  BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  SCHUURMANS FRANK JEROEN P ,  VAUDREVANGE DOMINIK ,  WILHELMUS VAN HERPEN MAARTEN M

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

Abstract: PROBLEM TO BE SOLVED: To lessen an amount of debris coming into an illuminating system and prolong the life of a collector in a radiation system. SOLUTION: The radiation system of the lithography device is provided with at least either of a pollutant trap that traps substances discharged from a radiation source and a collector that condenses radiated beams. At least either of the pollutant trap and the collector is provided with elements disposed in the path of radiation beams, the substances discharged from the radiation source can be attached to the elements while the radiation beams propagate in the radiation system. At least a part of the elements disposed in the path of the radiation beams has a surface of big mirror grazing incidence reflectance for lessening the absorption of the radiation beams that propagate substantially in non-parallel directions to the surfaces of the elements and reducing thermal load which the elements encounter. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：减少进入照明系统的碎屑的量并延长辐射系统中收集器的寿命。 解决方案：光刻装置的辐射系统设置有捕集从辐射源排出的物质的污染物捕集阱和冷凝辐射束的收集器中的至少一种。 污染物捕集器和收集器中的至少一个设置有设置在辐射束路径中的元件，从辐射源排出的物质可以在辐射束在辐射系统中传播的同时附着到元件上。 设置在辐射束的路径中的元件的至少一部分具有大的镜面掠入射反射率的表面，用于减小基本上在非平行方向上传播到元件表面的辐射束的吸收并降低热负荷 元素遇到的。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007173805A

公开(公告)日：2007-07-05

申请号：JP2006336392

申请日：2006-12-13

Applicant: Asml Netherlands Bv ,  Koninkl Philips Electronics Nv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ

Inventor： BANINE VADIM YEVGENYEVICH ,  BAKKER LEVINUS P ,  KURT RALPH ,  JOSEPHINA MOORS JOHANNES HUBER ,  STEVENS LUCAS HENRICUS JOHANNE ,  ZALM PETER C

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G01N25/142 ,  G01N25/68 ,  Y10T436/25875

Abstract: PROBLEM TO BE SOLVED: To provide an improved system and method for monitoring contamination in which the occurrence of the contamination is quickly detected using a comparatively easy and inexpensive monitoring device. SOLUTION: The system which detects at least one contamination species in the internal space of a lithography device includes at least one monitoring surface constituted as an internal space contact is carried out, a thermal controller configured so that the temperature on the monitoring surface may be controlled to at least one detection temperature, and at least one detector constituted so that the condensation of up to at least one monitoring surface of the contamination species might be detected. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于监测污染的改进的系统和方法，其中使用相对容易且廉价的监测装置快速检测污染物的发生。 检测光刻设备的内部空间中的至少一种污染物质的系统包括至少一个作为内部空间接触构成的监测表面;热控制器，被配置成使得监测表面上的温度 可以被控制到至少一个检测温度，并且至少一个检测器被构造成可以检测污染物质的至多一个监测表面的冷凝。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：DE602004021328D1

公开(公告)日：2009-07-16

申请号：DE602004021328

申请日：2004-07-08

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS P

IPC: G21K1/06 ,  G02B1/00 ,  G02B5/09 ,  G02B5/18 ,  G03F7/20 ,  H01L21/027

Abstract: The invention is relates to a mirror, having a mirroring surface, wherein the mirroring surface comprises one or more protrusions comprising a material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, or wherein the mirroring surface comprises one or more first protrusions comprising a first material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and one or more second protrusions comprising a second material selected from at least one of Be, B, C, Si, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and wherein the first and second materials are not the same. The inventions is further related to a lithographic projection apparatus comprising such mirrors. The invention also relates to a device manufacturing method using such lithographic apparatus.