公开(公告)号：JP2006222426A

公开(公告)日：2006-08-24

申请号：JP2006028417

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  LEONARDUS FRANKEN JOHANNES CHR ,  JOSEPHINA MOORS JOHANNES HUBER ,  SPEE CAROLUS IDA MARIA ANTONIU ,  WASSINK ARNOUD C ,  ANTONIUS BROM PAUL P A

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a method for removal of deposition on an optical element of a lithographic apparatus, and the lithographic apparatus. SOLUTION: The method for removal of deposition on a radiation collector of a lithographic apparatus includes a process of providing a gas barrier to the end of the radiation collector, thereby providing a radiation collector enclosure volume; a process of providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen, deuterium and/or tritium containing gas; and a process of removing at least part of the deposition from the radiation collector. The lithographic apparatus includes the radiation collector; a circumferential hull enclosing the radiation collector; and the gas barrier at the end of the radiation collector, thereby providing the radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet feeds a gas to the radiation collector enclosure volume and an outlet exhausts a gas from the radiation collector enclosure volume. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2006191091A

公开(公告)日：2006-07-20

申请号：JP2005377813

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： WASSINK ARNOUD C ,  BAKKER LEVINUS PIETER ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a filter system for actively catching debris particles by rotating a foil trap, and for cooling the foil trap in a lithography device. SOLUTION: This lithography device is provided with an illumination system configured so that radiation beams can be conditioned, a projection system configured so that the radiation beams can be projected to a substrate and a filter system for filter-removing debris particles from the radiation beam. A filter 820 system includes a plurality of foils F1 and F2 for trapping debris particles, supports S1 and S2 for storing a plurality of foils and cooling systems CS1 and CS2 having surfaces configured to be cooled. The cooling systems and supports are positioned so that a gap G can be formed between the surface of the cooling system and the support. The cooling system is configured to inject gas into the gap. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于通过旋转箔捕获器并且用于在光刻装置中冷却箔捕获器来主动捕获碎屑颗粒的过滤系统。 解决方案：该光刻设备设置有照明系统，其被配置为可以对辐射束进行调节;投影系统被配置成使得辐射束可以投射到基底和用于从 辐射束。 过滤器820系统包括用于捕集碎屑颗粒的多个箔F1和F2，用于存储多个箔的支撑件S1和S2以及具有被配置为被冷却的表面的冷却系统CS1和CS2。 冷却系统和支撑件被定位成使得可以在冷却系统的表面和支撑件之间形成间隙G. 冷却系统配置成将气体注入到间隙中。 版权所有（C）2006，JPO＆NCIPI