公开(公告)号：NL2006573A

公开(公告)日：2011-11-21

申请号：NL2006573

申请日：2011-04-08

Applicant: ASML NETHERLANDS BV

Inventor： ONVLEE JOHANNES ,  DEKKER ALBERT ,  SPIERDIJK JOHANNUS ,  MAN HENDRIK

IPC: G03F7/20

Abstract: A lithographic apparatus including an optical column to project a beam on a target portion of a substrate is disclosed, the optical column having a projection system configured to project the beam onto the target portion. The apparatus further includes an actuator to move the optical column or at least part thereof with respect to the substrate and a window (940) between the moving part of the optical column and the target portion of the substrate and/or between the moving part of the optical column and a non -moving part of the optical column, the window constructed and arranged within the apparatus to reduce or minimize movement of the window.

公开(公告)号：NL2007789A

公开(公告)日：2012-06-11

申请号：NL2007789

申请日：2011-11-15

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  MAN HENDRIK

IPC: G03F7/20

Abstract: A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.

公开(公告)号：NL2006257A

公开(公告)日：2011-08-24

申请号：NL2006257

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK ,  DEKKER ALBERT ,  SPIERDIJK JOHANNUS PETRUS FRANSISCUS ,  MAN HENDRIK

IPC: G03F7/20