公开(公告)号：NL2012052A

公开(公告)日：2014-08-04

申请号：NL2012052

申请日：2014-01-07

Applicant: ASML NETHERLANDS BV

Inventor： SMEETS DRIES ,  BLEEKER ARNO ,  LEE CHRIS ,  JAGER PIETER ,  MULDER HEINE ,  PELLENS RUDY

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2006254A

公开(公告)日：2011-08-24

申请号：NL2006254

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ONVLEE JOHANNES ,  JAGER PIETER ,  ZWET ERWIN

IPC: G03F7/20

公开(公告)号：NL2010761A

公开(公告)日：2013-12-04

申请号：NL2010761

申请日：2013-05-07

Applicant: ASML NETHERLANDS BV

Inventor： MULDER HEINE ,  JAGER PIETER

IPC: G03F7/20

公开(公告)号：NL2009239A

公开(公告)日：2013-03-04

申请号：NL2009239

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BLEEKER ARNO ,  BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

IPC: G03F7/20

公开(公告)号：NL2006262A

公开(公告)日：2011-08-24

申请号：NL2006262

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  ONVLEE JOHANNES ,  ZWET ERWIN

IPC: G03F7/20

公开(公告)号：NL2006256A

公开(公告)日：2011-08-24

申请号：NL2006256

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

IPC: G03F7/20

公开(公告)号：NL2006255A

公开(公告)日：2011-08-24

申请号：NL2006255

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

IPC: G03F7/20

公开(公告)号：NL2013663A

公开(公告)日：2015-05-07

申请号：NL2013663

申请日：2014-10-22

Applicant: ASML NETHERLANDS BV

Inventor： AKKERMANS JOHANNES ,  AMENT LUCAS ,  BANINE VADIM ,  COENEN TEIS JOHAN ,  JAGER PIETER ,  VRIES GOSSE ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  LUITEN OTGER ,  NIKIPELOV ANDREY

IPC: G03F7/20 ,  H01S3/00

公开(公告)号：NL2013518A

公开(公告)日：2015-03-30

申请号：NL2013518

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  AMENT LUCAS ,  JAGER PIETER ,  VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  GORKOM RAMON ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: H05G2/00 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2013014A

公开(公告)日：2014-12-22

申请号：NL2013014

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: G03F7/20

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.