公开(公告)号：JP2006186368A

公开(公告)日：2006-07-13

申请号：JP2005371980

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV

Inventor： HAUSCHILD JAN ,  DEN BOEF ARIE J ,  ANTONIUS LEENDERS MARTINUS H ,  MICKAN UWE ,  MARIA VANNEER ROELAND N

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an exposure device, tilt equipment, a method for conducting a tilt convergence test, and a device manufactured by the same. SOLUTION: The exposure device is equipped with a lighting system for providing a projection radiation beam, a support structure which is equipped with a pattern and supports equipment functioning to impart a pattern to a section of the projection beam, a table for holding a target object, a projection system for projecting a patterned beam on the target object, and the tilt equipment for providing a tilted projection beam. The tilt equipment is provided substantially on a pupil plane of the projection system. COPYRIGHT: (C)2006,JPO&NCIPI