公开(公告)号：NL2017829A

公开(公告)日：2017-06-26

申请号：NL2017829

申请日：2016-11-21

Applicant: ASML NETHERLANDS BV

Inventor： LAURENTIUS JOHANNES ADRIANUS VAN BOKHOVEN ,  RUUD HENDRICUS MARTINUS JOHANNES BLOKS ,  JOHAN GERTRUDIS CORNELIS KUNNEN ,  GÜNES NAKIBOGLU ,  MARINUS JAN REMIE

IPC: G03F7/20

Abstract: The present invention relates to an apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across a surface thereof. The present invention includes a patterning apparatus for a lithographic apparatus comprising: a patterning device support structure configured to support a patterning device; a patterning device conditioning system comprising at least one first gas outlet configured to provide a gas flow over a surface of the patterning device and at least one second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system. The control system may be configured to control the temperature and gas flow rate of the gas exiting the first gas outlet and separately to control the temperature and gas flow rate of the gas exiting the second gas outlet.

公开(公告)号：SG174691A1

公开(公告)日：2011-10-28

申请号：SG2011017159

申请日：2011-03-09

Applicant: ASML NETHERLANDS BV

Inventor： NICOLAAS TEN KATE ,  JOOST JEROEN OTTENS ,  BASTIAAN ANDREAS WILHELMUS HUBERTUS KNARREN ,  ROBBERT JAN VOOGD ,  GIOVANNI FRANCISCO NINO ,  MARINUS JAN REMIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

Abstract: Lithographic Apparatus and MethodA lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.[Fig. 9]