公开(公告)号：JP2011192991A

公开(公告)日：2011-09-29

申请号：JP2011049270

申请日：2011-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a heater 400 and/or a temperature sensor 500 on a surface. The surface is a surface of at least one selected from the substrate table structured to support the substrate on a substrate support area, a liquid handling system, a projection system, a surface of a lattice of a positional measurement device or a sensor, and/or an exchange bridge. A nodal plate 600 is further included so as to support the substrate. The surface, on which the heater and/or temperature sensor are formed, is a surface of the nodal plate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备在表面上包括加热器400和/或温度传感器500。 该表面是选自被构造成将基板支撑在基板支撑区域上的至少一个表面，液体处理系统，投影系统，位置测量装置或传感器的格子表面和/ 或交换桥。 还包括节点板600以支撑衬底。 形成加热器和/或温度传感器的表面是节点板的表面。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011192992A

公开(公告)日：2011-09-29

申请号：JP2011049279

申请日：2011-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a substrate table configured to support the substrate on a substrate supporting area and including a plurality of heaters 400 and/or temperature sensors 500 arranged adjacently to a center part of the substrate supporting area. The plurality of heaters and/or sensors are elongated in a parallel direction substantially, and extend over the substrate support area from one edge end part to an opposite edge end part. A time when they are under a projection system during a period of imaging becomes shorter than a case where an elongated direction of the heaters and/or sensors are perpendicularly oriented to a first direction. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备包括：衬底台，其被配置为将衬底支撑在衬底支撑区域上，并且包括多个与衬底支撑区域的中心部分相邻布置的加热器400和/或温度传感器500。 多个加热器和/或传感器基本上在平行方向上伸长，并且在基板支撑区域上从一个边缘端部延伸到相对边缘端部。 在成像期间它们处于投影系统下方的时间比加热器和/或传感器的细长方向垂直地朝向第一方向的情况变短。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2013038420A

公开(公告)日：2013-02-21

申请号：JP2012169243

申请日：2012-07-31

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  MARTIN HUBEN ,  LAURENT THIBAULT SIMON MATHIEU ,  VAN BOXTEL FRANK JOHANNES JACOBUS ,  SANDER KATHARINA REINIER DERKS ,  LAMBERTUS DONDERS SJOERD NICOLAAS

IPC: H01L21/027 ,  G02B21/26 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/683

Abstract: PROBLEM TO BE SOLVED: To improve compensation of cooling of a substrate due to evaporation of immersion liquid.SOLUTION: A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table. The gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m K) at 298 K.

Abstract translation: 要解决的问题：改善由于浸没液体的蒸发引起的基板冷却补偿。 解决方案：公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体。 由气体处理系统提供的气体在298K时具有大于或等于100mW /（m K）的热导率。版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011151397A

公开(公告)日：2011-08-04

申请号：JP2011009381

申请日：2011-01-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  LAURENT THIBAULT SIMON MATHIEU ,  MIRANDA MARCIO ALEXANDRE CANO ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES ,  FENG PENG ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic process where a process error caused by one or more heat sources can be reduced or minimized. SOLUTION: An immersion lithographic apparatus is provided. The immersion lithographic apparatus has a substrate table including a drain so configured as to receive an immersion liquid leaking into a gap between the edge of a substrate on the substrate table and the edge of a concave portion where the substrate is disposed. By directing one or more jets of the liquid toward the back side of a portion that supports the substrate, at least a portion of the concave portion that supports the substrate is thermally adjusted, thus providing a thermal adjustment system in the immersion lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少或最小化由一个或多个热源引起的过程误差的光刻工艺。 解决方案：提供浸没式光刻设备。 浸没式光刻设备具有衬底台，该衬底台包括漏液，其被构造成接收浸没液体泄漏到衬底台上的衬底的边缘与设置衬底的凹部的边缘之间的间隙中。 通过将液体的一个或多个射流引导到支撑衬底的部分的后侧，至少支撑衬底的凹部的一部分被热调节，从而在浸没式光刻设备中提供热调节系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：SG188036A1

公开(公告)日：2013-03-28

申请号：SG2012052569

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAULT SIMON MATHIEU ,  CORCORAN GREGORY MARTIN MASON ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  PIETERSE GERBEN ,  GUNTER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  DERKS SANDER CATHARINA REINIER

Abstract: LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHICA support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.(Figure 8)

公开(公告)号：SG174691A1

公开(公告)日：2011-10-28

申请号：SG2011017159

申请日：2011-03-09

Applicant: ASML NETHERLANDS BV

Inventor： NICOLAAS TEN KATE ,  JOOST JEROEN OTTENS ,  BASTIAAN ANDREAS WILHELMUS HUBERTUS KNARREN ,  ROBBERT JAN VOOGD ,  GIOVANNI FRANCISCO NINO ,  MARINUS JAN REMIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

Abstract: Lithographic Apparatus and MethodA lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.[Fig. 9]