公开(公告)号：KR20200125942A

公开(公告)日：2020-11-05

申请号：KR20207025275

申请日：2019-02-28

Applicant: ASML NETHERLANDS BV

Inventor： MA YUE ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HUMMLER KLAUS MARTIN ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  ROMMERS JEROEN HUBERT ,  VAN DE WIEL HUBERTUS JOHANNES ,  LAFORGE ANDREW DAVID ,  BRIZUELA FERNANDO ,  WIEGGERS ROB CARLO ,  GOMES UMESH PRASAD ,  NEDANOVSKA ELENA ,  KORKMAZ CELAL ,  KIM ALEXANDER DOWNN ,  DUARTE RODRIGUES NUNES RUI MIGUEL ,  VAN DIJCK HENDRIKUS ALPHONSUS LUDOVICUS ,  VAN DRENT WILLIAM PETER ,  JONKERS PETER GERARDUS ,  ZHU QIUSHI ,  YAGHOOBI PARHAM ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  ERSHOV ALEXANDER IGOREVICH ,  FOMENKOV IGOR VLADIMIROVICH ,  LIU FEI ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUZNETSOV ALEXEY SERGEEVICH

IPC: G03F7/20 ,  G02B5/08 ,  G02B27/00 ,  H05G2/00

Abstract: EUV 방사선을생성하기위한시스템(SO) 내의하나이상의반사광학요소의반사율열화는광학요소를포함하는진공챔버(26) 내로의가스의제어된도입에의하여감소된다. 가스는수소와같은또 다른가스의흐름에추가될수 있거나수소라디칼의도입과번갈아가며추가될수 있다.

公开(公告)号：JP2012124539A

公开(公告)日：2012-06-28

申请号：JP2012071249

申请日：2012-03-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminates such energy loss in a lithographic apparatus as occurs by evaporation of a provided liquid which locally cools associated components leading to deformations and deterioration that may cause defocus and lens aberration in immersion lithography where a space between a projection system and a substrate is filled with an immersion liquid to increase the numerical aperture.SOLUTION: A timetable 34 is prepared which comprises information regarding the time and the position, the speed, the acceleration etc. of the substrate W at which evaporation of a provided liquid 11 is most likely to occur. A liquid evaporation controller 30 heats at least a part of the substrate W by a heater or sends humidified air to prevent local evaporation, according to the timetable 34.

Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的这种能量损失，如通过蒸发局部冷却相关部件的所提供的液体而发生的，导致变形和劣化，这可能导致散焦和透镜像差 浸没光刻，其中投影系统和衬底之间的空间被浸没液体填充以增加数值孔径。 解决方案：制备时间表34，其包括关于最可能发生所提供的液体11的蒸发的基板W的时间和位置，速度，加速度等的信息。 液体蒸发控制器30根据时间表34通过加热器加热至少一部分基板W或者发送加湿空气以防止局部蒸发。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012147015A

公开(公告)日：2012-08-02

申请号：JP2012083578

申请日：2012-04-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARCO COELHO STAUFEN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MARIA

IPC: H01L21/027 ,  G02B21/26

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide various types of pressure regulation means for reducing a pressure gradient in a liquid supply system of a lithographic apparatus.SOLUTION: The liquid supply system has a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer liquid/damper to compensate for pressure fluctuation.

Abstract translation: 要解决的问题：提供用于降低光刻设备的液体供应系统中的压力梯度的各种类型的压力调节装置。 解决方案：液体供应系统具有液体限制结构，其被配置为至少部分地将液体限制在光刻设备的投影系统和衬底台之间。 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管， 压力调节器或限流器，以防止冲击波，以及缓冲液/阻尼器来补偿压力波动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012064982A

公开(公告)日：2012-03-29

申请号：JP2011285516

申请日：2011-12-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors arising from an immersion liquid.SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device capable of imparting a pattern to the radiation beam in its cross section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 支撑构造以支撑能够在其横截面中将辐射束赋予图案以形成图案化辐射束的图案形成装置; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011192991A

公开(公告)日：2011-09-29

申请号：JP2011049270

申请日：2011-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a heater 400 and/or a temperature sensor 500 on a surface. The surface is a surface of at least one selected from the substrate table structured to support the substrate on a substrate support area, a liquid handling system, a projection system, a surface of a lattice of a positional measurement device or a sensor, and/or an exchange bridge. A nodal plate 600 is further included so as to support the substrate. The surface, on which the heater and/or temperature sensor are formed, is a surface of the nodal plate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备在表面上包括加热器400和/或温度传感器500。 该表面是选自被构造成将基板支撑在基板支撑区域上的至少一个表面，液体处理系统，投影系统，位置测量装置或传感器的格子表面和/ 或交换桥。 还包括节点板600以支撑衬底。 形成加热器和/或温度传感器的表面是节点板的表面。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071513A

公开(公告)日：2011-04-07

申请号：JP2010210311

申请日：2010-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  VAN DONK GERRIT ,  VEN ES JOHANNES

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces uneven cooling of an object so that the object may be maintained at a substantially uniform temperature. SOLUTION: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe configured to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供减少物体的不均匀冷却的系统，使得物体可以保持在基本均匀的温度。 解决方案：提供一种光刻设备，其包括被配置为保持基板的基板保持器和被配置为将基板保持器保持在基本上均匀的温度的热管。 热管具有容纳液体储存器和蒸汽空间的室，以及在室中至少部分地与液体接触的加热元件。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011069608A

公开(公告)日：2011-04-07

申请号：JP2010210310

申请日：2010-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  PATEL HRISHIKESH ,  VAN DONK GERRIT ,  VEN ES JOHANNES

IPC: F28D15/02 ,  H01L21/027

CPC classification number: F28D15/04 ,  G03F7/70341 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing the non-uniform cooling of an object such that the object is maintained at a substantially uniform temperature.
SOLUTION: The heat pipe maintains the object at a substantially uniform temperature. The heat pipe includes a liquid reservoir and a vapor space, a chamber with one part defined by a condensation face, and a liquid transport device applying force adding to gravity to a liquid and transporting the liquid from the condensation face to the reservoir. The condensation face is formed such that a condensation liquid is moved toward the liquid transport device along the condensation face.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少物体的不均匀冷却的系统，使得物体保持在基本均匀的温度。

解决方案：热管将物体保持在基本均匀的温度。 热管包括液体储存器和蒸汽空间，具有由冷凝面限定的一部分的腔室以及将重力加到液体并将液体从冷凝面传送到储液器的液体输送装置。 冷凝面形成为使得冷凝液沿着冷凝面向液体输送装置移动。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011192992A

公开(公告)日：2011-09-29

申请号：JP2011049279

申请日：2011-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a substrate table configured to support the substrate on a substrate supporting area and including a plurality of heaters 400 and/or temperature sensors 500 arranged adjacently to a center part of the substrate supporting area. The plurality of heaters and/or sensors are elongated in a parallel direction substantially, and extend over the substrate support area from one edge end part to an opposite edge end part. A time when they are under a projection system during a period of imaging becomes shorter than a case where an elongated direction of the heaters and/or sensors are perpendicularly oriented to a first direction. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备包括：衬底台，其被配置为将衬底支撑在衬底支撑区域上，并且包括多个与衬底支撑区域的中心部分相邻布置的加热器400和/或温度传感器500。 多个加热器和/或传感器基本上在平行方向上伸长，并且在基板支撑区域上从一个边缘端部延伸到相对边缘端部。 在成像期间它们处于投影系统下方的时间比加热器和/或传感器的细长方向垂直地朝向第一方向的情况变短。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2011003900A

公开(公告)日：2011-01-06

申请号：JP2010137799

申请日：2010-06-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic device capable of keeping the position of a liquid as constant as possible by controlling the position of an immersion liquid in the immersion lithographic device.SOLUTION: The immersion lithographic device includes a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface. In relation to a liquid trapping structure constructed or configured to trap a liquid in an immersion space between a final element of a projection system and a board table and/or a board supported to the board table, a liquid trapping structure is also provided including a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface.

Abstract translation: 要解决的问题：提供一种能够通过控制浸没式光刻设备中的浸液的位置来保持液体位置尽可能恒定的浸没式光刻设备。解决方案：浸没式光刻设备包括弯曲的曲面 使得表面张力的排水力在弯曲表面上的浸没液体的膜上沿某一方向作用。 关于构造或构造成将液体捕获到投影系统的最终元件和板台之间的浸没空间中的液体捕获结构和/或支撑在板台上的板，还提供了液体捕获结构，其包括 弯曲的曲面，使得表面张力的排水力在一定方向上作用在弯曲表面上的浸没液体的膜上。