公开(公告)号：NL2021358A

公开(公告)日：2018-08-16

申请号：NL2021358

申请日：2018-07-20

Applicant: ASML NETHERLANDS BV

Inventor： DERICK YUN CHEK CHONG ,  PIETER CRISTIAAN DE GROOT ,  JOHANNES JACOBUS MATHEUS BASELMANS ,  ROBBERT JAN VOOGD

IPC: G03F7/20

Abstract: A phase stepping method for determining an aberration map for a projection system and an apparatus for carrying out said method. The method uses first patterned region arranged in an object plane of the projection system and a second patterned region arranged in an image plane of the projection system. At least one of the first and second patterning regions is moved in a shearing direction to generate an 5 oscillating phase stepping signal. A set of coefficients that characterize the aberration map of the projection system are determined by equating the phase of a harmonic of the oscillating signal at each of the plurality of positions on the radiation detector to a combination of a plurality of differences in the aberration map between a pair of positions in a pupil plane of the projection system and solving to find the set of coefficients. 10

公开(公告)号：NL2017356A

公开(公告)日：2017-03-30

申请号：NL2017356

申请日：2016-08-24

Applicant: ASML NETHERLANDS BV

Inventor： ROBBERT JAN VOOGD ,  JOHANNES JACOBUS MATHEUS BASELMANS ,  BEARRACH MOEST ,  JEAN-PHILIPPE XAVIER VAN DAMME ,  ROLAND JOHANNES WILHELMUS STAS

IPC: G03F7/20

Abstract: Controlling, based on characteristics, a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle, the method comprising determining the characteristics of the projecting in a calibration mode, and the controlling comprising moving in the exposure mode at least one of the projection system, the reticle stage and the substrate table during the exposing in dependence on the characteristics.

公开(公告)号：SG174691A1

公开(公告)日：2011-10-28

申请号：SG2011017159

申请日：2011-03-09

Applicant: ASML NETHERLANDS BV

Inventor： NICOLAAS TEN KATE ,  JOOST JEROEN OTTENS ,  BASTIAAN ANDREAS WILHELMUS HUBERTUS KNARREN ,  ROBBERT JAN VOOGD ,  GIOVANNI FRANCISCO NINO ,  MARINUS JAN REMIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

Abstract: Lithographic Apparatus and MethodA lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.[Fig. 9]

公开(公告)号：NL2018989A

公开(公告)日：2017-12-05

申请号：NL2018989

申请日：2017-05-30

Applicant: ASML NETHERLANDS BV

Inventor： GERARD FRANS JOZEF SCHASFOORT ,  PIETER DE GROOT ,  PIETER-JAN VAN ZWOL ,  MAKSYM YURIIOVYCH SLADKOV ,  MANFRED PETRUS JOHANNES MARIA DIKKERS ,  JOZEF MARIA FINDERS ,  WOUTER JOEP ENGELEN ,  JOHANNES JACOBUS MATHEUS BASELMANS ,  ROBBERT JAN VOOGD ,  MARCUS ADRIANUS VAN DE KERKHOF ,  STEFAN BAUMER ,  LAURENTIUS CORNELIUS DE WINTER

IPC: G03F7/20

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

公开(公告)号：NL2016732A

公开(公告)日：2016-12-12

申请号：NL2016732

申请日：2016-05-04

Applicant: ASML NETHERLANDS BV

Inventor： JELTE RIENTS BEARDA ,  JOOST ANDRÉ KLUGKIST ,  ROBBERT JAN VOOGD ,  GUIDO HERGENHAN ,  MEIK PANITZ ,  JOCHEN TAUBERT

IPC: G03F7/20

Abstract: A method of forming a radiation filter for use in a lithographic system comprises obtaining a filter body and forming at least one structure in or on the body, wherein the at least one structure provides a filtering effect and least one of a), b), c) or d):- a) the at least one structure comprises a plurality of transmissive, reflective, 5 absorbing or fluorescent structures, and the method comprises providing a desired distribution of the structures to provide a desired filtering effect; b) forming the at least one structure comprises forming at least one transmissive, absorbing, reflective or fluorescent layer that has a variable thickness; c) forming the at least one structure comprises altering at least one optical property 10 to provide a variation of the optical property with position; d) the structure comprises a fluorescent layer that provides variation of at least one fluorescence property with position and/or angle of incidence. (Fig 2A) 15

公开(公告)号：NL2017748A

公开(公告)日：2017-06-07

申请号：NL2017748

申请日：2016-11-09

Applicant: ASML NETHERLANDS BV

Inventor： BEARRACH MOEST ,  ROBBERT JAN VOOGD ,  BART DINAND PAARHUIS ,  JOHANNES ONVLEE ,  CORNELIS MELCHIOR BROUWER ,  MARCEL THEODORUS MARIA VAN KESSEL

IPC: G03F7/20

Abstract: A method of controlling a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle. The method comprises determining characteristics of the projecting in a calibration mode. The determining comprises moving the reticle stage holding a further reticle protected by a further pellicle, the further reticle having a mark. During the moving the further reticle is illuminated with radiation to form an aerial image of the mark, the aerial image is projected via the projection system onto a sensor and the projected aerial image is sensed as received at the sensor. The characteristics of the sensed aerial image are determined.

公开(公告)号：NL2017222A

公开(公告)日：2017-02-27

申请号：NL2017222

申请日：2016-07-25

Applicant: ASML NETHERLANDS BV

Inventor： ROBBERT JAN VOOGD ,  WILHELMUS JACOBUS MARIA ROOIJAKKERS

IPC: G03F7/20

Abstract: An illumination system for a lithographic apparatus comprising a polarization adjustment apparatus arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates whilst substantially conserving the polarization state of the radiation.