公开(公告)号：JP2012119720A

公开(公告)日：2012-06-21

申请号：JP2012027270

申请日：2012-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  ALEXEI KOLESNE TCHENKO ,  ERIK ROHLOFF ROPESTRA ,  MEIJER HENDRICUS JOHANNES MARIA ,  MERTENS JEROEN JOHANNES SOPHIA M ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOHANNES THEODOOR ,  ALEXANDER STOLE YALE ,  BOB STREEFKERK ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which the space between the final element of a projection system, where the liquid loss from a supply system is minimized during exposure of the edge part of a substrate, and the substrate is filled with a liquid.SOLUTION: An edge sealing member 17 has an upper primary surface which is substantially in flush with the upper primary surface of a substrate W, and surrounds the substrate W or other object on a substrate table at least partially. Consequently, catastrophic liquid loss is prevented when the image at an edge part of the substrate W is captured or the edge part is illuminated even if the section under a projection lens PL is operated.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中在基板的边缘部分的曝光期间来自供应系统的液体损失最小化的投影系统的最终元件之间的空间和基板 充满液体。 解决方案：边缘密封构件17具有与基板W的上主表面基本上齐平的上主表面，并且至少部分地围绕基板W或基板台上的其它物体。 因此，即使拍摄基板W的边缘部分的图像或边缘部分被照亮，即使投影透镜PL下的部分被操作，也可以防止灾难性的液体损失。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010212713A

公开(公告)日：2010-09-24

申请号：JP2010102149

申请日：2010-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MERTENS JEROEN JOHANNES SOPHIA M ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projector in which the space between a final element of a projecting system and a substrate is filled with a liquid. SOLUTION: An edge sealing member 17 surrounds at least a part of a substrate W or other objects on a substrate table WT to prevent catastrophic liquid loss, when the edge of the substrate is imaged or illuminated. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影仪，其中投影系统的最终元件和基板之间的空间被填充液体。 解决方案：当基板的边缘成像或照明时，边缘密封构件17围绕基板W或基板台WT上的其它物体的至少一部分，以防止灾难性的液体损失。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG126920A1

公开(公告)日：2006-11-29

申请号：SG200602939

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF DE ROELOF FREDERICK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LEENDERS MARTINUS HENDRIKUS A ,  MERTENS JEROEN JOHANNES SOPHIA M ,  RIEPEN MICHEL

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps (22,25) in the substrate table (WT) by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. The apparatus comprises a device (32) configured to extract liquid, gas or both from the gap. The device configured to extract liquid, gas or both comprises a membrane configured to allow gas but not liquid to be extracted from the gap.