Abstract:
PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method which can prevent or restrict passage of contamination into a projection system of a lithographic apparatus.SOLUTION: A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.
Abstract:
PROBLEM TO BE SOLVED: To provide lithographic equipment having a line carrier assembly for smoothly guiding a plurality of lines. SOLUTION: Lithography equipment includes a plurality of flexible medium transfer lines and an assembly of a line carrier. The line carrier is constituted so that a plurality of flexible medium transfer lines are movably guided from one connection point of the equipment to another connection point. At least one of the two connection points is movable. At least one of the flexible medium transfer lines includes a base layer on the inner side on which a low friction outer layer is provided. The low friction outer layer has a friction smaller than that of the base layer on the inner side so that at least one of the flexible medium transfer lines is smoothly guided to the carrier and an adjacent flexible medium transfer line during the movement of at least one connection point. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
A lithographic apparatus includes an assembly of a plurality of flexible medium transfer lines and a line carrier, the liner carrier configured to moveably guide the plurality of flexible medium transfer lines from one connection point of the apparatus to another connection point, wherein at least one of the two connection points is movable. At least one of the flexible medium transfer lines includes an inner base layer having an outer low-friction layer provided thereon, the outer low-friction layer having lower friction capacities than the inner base layer so as to provide a smooth guiding of the at least one of the flexible medium transfer lines relative to the carrier and a neighbouring flexible medium transfer line during a movement of the at least one connection point.