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    Euv radiation generation apparatus
    2.
    发明专利
    Euv radiation generation apparatus 有权
    EUV辐射发生装置

    公开(公告)号：JP2011018901A

    公开(公告)日：2011-01-27

    申请号：JP2010148418

    申请日：2010-06-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  STAMM UWE ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA

    IPC: H01L21/027

    CPC classification number: G03F7/70941 ,  G03F7/70033 ,  G03F7/70575 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for effectively carrying and focusing the laser beam to the selected place within the EUV light source.SOLUTION: The EUV radiation generator includes a structure for defining an optical gain medium formed to generate laser radiation for interaction with a target material to generate the EUV radiation releasing plasma and an aperture through which the laser radiation can be guided. The structure also includes a radiation guide having the external surface that is constituted to guide the laser radiation to be separated from the optical gain medium.

    Abstract translation: 要解决的问题：提供一种用于有效地将激光束携带并聚焦到EUV光源内的所选位置的系统和方法。解决方案：EUV辐射发生器包括用于限定形成以产生激光辐射的光学增益介质的结构 用于与目标材料的相互作用以产生EUV辐射释放等离子体和可以引导激光辐射的孔。 该结构还包括具有外表面的辐射引导件，该外表面被构造成引导要从光学增益介质分离的激光辐射。

    RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS.
    5.
    发明专利
    RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2004837A

    公开(公告)日：2011-01-10

    申请号：NL2004837

    申请日：2010-06-07

    Applicant: ASML NETHERLANDS BV

    Inventor： LOOPSTRA ERIK ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  YAKUNIN ANDREI ,  GRAAF DENNIS ,  STAMM UWE

    IPC: H05G2/00 ,  G03F7/20

    Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

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